Tips on Selecting Chemical Delivery Systems for Your Application

Chemical delivery systems handle the chemical distribution required to maintain a variety of industrial processes. Corrosive or hazardous chemicals are securely stored and delivered to the process in specific concentrations or mixtures.

Chemical delivery systems integrated in processes like semiconductor manufacturing using wet bench equipment, allow safe operation with accurate amounts and quick change from one chemical to another. Chemical delivery system design needs to utilize correct storage methods and provide customization to meet the requirements of specific applications.

The list below includes specific factors that should be considered in selecting chemical delivery systems for your application:

·         How much of a particular chemical is used in the process?

·         How does the system calculate the required chemicals and how is the software for calculations supported?

·         What are the control options and do they integrate easily and well with wet bench controls?

·         What safety, error and leak detection features are available?

·         Is the system flexible enough to adapt to specific process requirements and can the supplier undertake such customization?

Apart from these questions, the supplier should have an excellent reputation and a wealth of experience in designing and handling chemical delivery systems.

One such company, Modutek Corporation, has vast experience designing and constructing chemical delivery systems that meet customers' specific requirements. It has a wide range of storage options from large volume storage to drums to carboys. These chemical delivery systems integrate seamlessly with the company's own wet bench stations and can typically work with wet benches from other companies. Modutek's chemical delivery systems are also safe, reliable, provide excellent performance and quick changeovers, and are also customizable to a customer’s specific requirements. Modutek has the internal expertise to evaluate customer requirements and will make appropriate recommendations that best support the application. Contact Modutek by email Modutek@modutek.com to learn more or read the complete article titled “Tips on Selecting Chemical Delivery Systems for Your Application.”

Reducing Wafer Processing Time and Costs with a Wafer Etching System

Semiconductor fabrication and research facilities can reduce wafer processing time and cost using Modutek’s rotary wafer etching system. This automated batch processor is a compact and freestanding wet bench unit with a dual tank design. It has a carrier assembly line that takes the wafer boats into the chemical tank where it provides rotational agitation for a set time. Next, it transfers the carrier assembly to the rinse tank for rinse cycles.

Once the rinse cycle is done, the carrier can be placed in the unload position were the wafer boats can be removed for drying. The rotation of the wafers in the baths is consistent, and the transfer of the wafers from the chemical tank to the rinse tank is also made much faster.

Modutek’s wafer etching system also features a touch screen control along with programmable recipes that provide full automatic wafer processing. Its microprocessor can control up to five recipes that are programmed via the touch screen. The screen displays the use and process information.

Once the operator turns on the process, the system will take control of the carrier and transfer it via the chemical and rinse cycles according to programmed values. It can accommodate multiple wafer sizes in one toll with a rotor change and it has a production capacity of up to fifty 6-inch or twenty-five 8-inch wafers at a time. Additional system options also include the capacity to handle larger wafer sizes, a chemical filtering and re-circulating system, a gravity chemical fill system, a fume condenser, and a heating/cooling system in the process tank.

Modutek's Rotary Wafer Etching System helps in reducing wafer processing time and costs. It delivers the chemical etching, stripping, cleaning, and developing solutions for semiconductor wafers or substrates. It boasts high precision, improved safety for operators and fast processing in a compact design.

Call or email Modutek Corporation at modutek@modutek.com to discuss how a wafer etching system can save your company time and money. You can also learn more by reading our entire article “Reducing Wafer Processing Time and Costs with a Wafer Etching System.”

Selecting the Right Equipment for Your Silicon Wet Etching Application

Fabrication facilities need use a semiconductor equipment supplier who can provide a wide range of dependable products to support their applications as well as meet their specific requirements.

Modutek has over 35 years of experience and expertise providing high-quality and reliable products for all silicon wet etching applications. The list below is some of the products Modutek offers to support wet etching applications.

1. Quartz Baths
Modutek's quartz baths support a wide range of etching, cleaning and stripping applications (which include the SC1 cleaning, RCA clean and SPM clean).

2. Sub-ambient Systems
Modutek's sub-ambient filtered etch baths are specially developed for BOE (buffered oxide etch) and positive resist develop applications. Various options are provided that allow customers to match the system to their requirements.

3. Temperature Controlled Circulators
The Modutek RCe Series of Temperature Controlled Recirculators are ideal for etching, plating and developing applications and constant temperature baths.  

4. Teflon Tanks
Modutek's Teflon tanks have a modular design which can be easily integrated into both new and existing silicon wet etching stations. Available configurations include temperature controlled recirculating baths, temperature controlled static baths as well as Teflon ambient baths.

5. Nitride Etch Baths
These baths are designed and developed for exceptional process control and operation safety. Modutek designs a two-tier control system that controls the temperature while keeping the acid-to-water ratio levels by adding DI water as required.

6. Quick Dump Rinsers
Modutek's Quick Dump Rinsers provide efficient and thorough rinsing without particle entrapment with less use of DI water. They include DI water spray nozzles and N2 agitation along with consistent rinsing with bottom filling.

7. Solvent Baths
These baths are made of stainless steel tanks and are ideal for all solvent applications (which include IPA, acetone and resist strippers).

Read our complete article entitled “Selecting the Right Equipment for Your Wet Etching Application” to learn more about equipment support for your application. Contact Modutek for a free quote and recommendation on selecting for your silicon wet etching application.

How the SPM Clean Process is Supported in a Wet Bench Process

Semiconductor manufacturing involves the use of many processing procedures, which include cleaning silicon wafers using wet bench technology.

The sulfuric peroxide mix (SPM) solution uses 3 parts sulfuric acid and 1 part of hydrogen peroxide at about 130 degrees Centigrade to remove any organic material and photoresist from silicon wafers fast and effectively. Process engineers using the SPM clean process in semiconductor fabrication need to ensure that the chemical ratio and temperature are maintained within the safety confines and that the wafers and the solution are safely contained in impervious baths.

Modutek's wet benches support the SPM process in their manual, semi-automatic and fully automatic versions. These wet bench stations are also available in a wide range of configurations, and the designs can be customized.

In quartz recirculating baths, the SPM solution has to be heated quickly in a bath that can tolerate high temperatures and will not react with the strong chemicals. Heating has to be controlled and even, because at high temperatures the hydrogen peroxide would disintegrate and the solution has to be spiked with more peroxide to maintain its concentration.

Modutek's quartz baths support all the requirements for the SPM process. These quartz baths have an operating temperature that range from 30 to 180 degrees centigrade and feature a standard heat up rate of 2 degrees centigrade a minute. The operating temperatures can be regulated to within plus or minus one 1 degree centigrade. The liquid level sensor feature is optional. The tanks are available in standard sizes and depths, but they can also be customized as well.

Modutek's wet bench stations and quartz baths are cost-effective, designed to reduce errors as well as to improve performance, leading to higher throughput and better output quality. For a free consultation or to get a quote, contact Modutek or email Modutek@modutek.com. For more details read the complete article titled “How the SPM Clean Process is Supported in a Wet Bench Process”.

How Megasonic Cleaning Technology Improves Silicon Wafer Yields

Silicon wafer cleaning is an essential and critical part of semiconductor manufacturing. Particles must be removed from the wafer substrate during processing without damaging the delicate microcircuit structures. This will result in defective semiconductor components or low-quality output.

In megasonic cleaning systems, a megasonic frequency generator creates high-frequency sound waves in a liquid via a transducer which is submerged in a cleaning tank. The sound waves are compression waves that appear either in high-frequency peaks or low-frequency troughs. The low-frequency troughs produce cavitation bubbles which break down in high-pressure peaks. These bubbles provide the cleaning action for removing contaminants that are on the surface of the wafer. Low ultrasonic frequencies (20 to 40 kHz) produce large, high-energy bubbles which clean more robust surfaces, while high ultrasonic frequencies produce smaller bubbles, ideal for cleaning delicate components.

The megasonic cleaning technology used in the process will effectively remove sub-micron particles and contaminants without damaging or altering the wafer's surface. Selecting the right frequencies and power levels is essential for effective cleaning results. Modutek incorporates the Kaijo Corporation high-frequency Megasonic Cleaning technology into its wet bench process equipment.

Kaijo's megasonic generators in Modutek’s wet benches operate at 950 kHz in the standard version. Other frequencies are also available for a variety of cleaning applications. Modutek has included Kaijo's megasonic cleaning system in both direct and indirect bath designs. Semiconductor facilities can use Modutek's wet benches which incorporate the use megasonic cleaning technology to effectively improve yields. Benefits of using the technology include faster cleaning time, higher cleaning effectiveness, and lower use of costly chemicals and their disposal.   

If you have questions about using Modutek’s wet bench stations which incorporate megasonic cleaning technology, call Modutek or email Modutek@modutek.com. For more details read the the full-length article entitled “How Megasonic Cleaning Technology Improves Silicon Wafer Yields.”

Chemical Delivery Systems That Meet Your High Tech Manufacturing Requirements

Modutek designs and develops custom chemical delivery systems to meet the specific requirements of manufacturing customers. These customers consist of industrial and research facilities who use chemicals for their processes and need a reliable and safe chemical system to store chemicals for ready use.

Typical applications of these systems include wet processing stations, wet benches, fume hoods, plating stations, precision cleaning stations, and acid exhaust hoods.

These custom chemical delivery systems feature all-Teflon fluid paths with double containment cabinet construction and leak detection. All chemical delivery is automated with a touch screen which provides important data including levels and alarms. Modutek's proprietary Solid Works Simulation Professional and SolidWorks Flow Simulation software allows customers to mix chemicals and perform delivery calculations to their specifications.

Modutek's chemical delivery systems are built to the highest standards and according to the customer's preferences. Customers can also request to be present at final testing at Modutek’s facility to ensure that the equipment meets all their specifications and they are fully satisfied with the results.

The advanced technology and high quality components used in Modutek’s chemical delivery systems reduce customer costs, reduce hazardous waste, and improve productivity and higher throughput. They are also safe and reliable, which helps customers achieve performance and productivity goals. Modutek’s chemical delivery systems can also be designed specifically to meet customer specifications.

For a free consultation or quote on selecting a chemical delivery system call Modutek at 866-803-1533 or email Modutek@modutek.com. You can read more details about Modutek’s chemical delivery systems by reading the blog article on the main site entitled “Chemical Delivery systems That Meet Your High Tech Manufacturing Requirements.”

Silicon Wafer Etching Processes for Wet Processing Applications

Manufacturing semiconductor components like processors and integrated circuits relies on silicon wafer etching of various processes including KOH etching to generate the required structures and connections.

Modutek's wet benches and other equipment can be used for a wide range of wet processing applications, which include:

KOH Etching – This involves the use of potassium hydroxide (KOH) in etching silicon wafers. This process is used to create microscopic structures in the silicon. It is important to note that KOH etching is a repeatable process that is inexpensive and etches quickly. Modutek's PFA Teflon tanks of their TFa or TT series are suitable for this etching application.

Silicon Nitride Etch – This is deposited on the silicon wafer in a thin film form and is etched with a hot phosphoric acid. It is used as a masking material in the fabrication of integrated circuits. Modutek's silicon nitride etch baths are suitable and safe for supporting this etching process.

Piranha Etch – This is used to clean silicon wafers during the semiconductor manufacturing process. The cleaning agent in this application consists of a mixture of sulfuric acid and hydrogen peroxide. Modutek can evaluate the customer's specific cleaning requirements and propose suitable solutions from its vast product line of wet processing equipment.

Metal Etch - Etching metals such as aluminum, gold and copper can be challenging process. Effective etching depends on selecting the right chemicals to use with the process. Modutek's vacuum metal etcher was developed and designed for precise wet etching of aluminum layers.

Gallium Arsenide (GaAs) Etch – Modutek's wet process solutions can handle the etching of Gallium Arsenide, which is used in the manufacture of integrated circuits and other electric and electronic devices. The solutions used consist of hydrogen peroxide, usually combined with sulfuric, hydrochloric, and phosphoric acids.

Modutek’s Wet Bench Solutions deliver reliable, repeatable results that are safe and accurate. For a free quote or assistance in selecting the right equipment for your silicon wafer etching process, contact Call Modutek at 866-803-1533 or send an email to Modutek@modutek.com. You can learn more about Modutek’s silicon wafer etching processes by reading “Silicon Wafer Etching Processes for Wet Processing Applications.”

Silicon Wafer Strip Solutions for Wet Processing Equipment Applications

 Modutek Corporation offers a wide range of wet processing equipment that is also customizable to deliver solutions for specialized applications. Silicon wafer strip solutions, the company can deliver various types of equipment that will support the following applications:

Silicon Nitride Strip
The silicon nitride strip removes silicon nitride from silicon wafers containing integrated circuits in a hot acid bath. The main factors for a high quality result are the selectivity of the bath strip solution along with consistently repeating all the process variables. 

The Modutek Nb series silicon nitride etch bath regulates the bath temperature while adding de-ionized water to control the water-to-acid ratio which provides the desired selectivity and repeatability of the process.

Resist Strip
For the photoresist strip, Modutek offers and advanced ozone cleaning process which can clean, etch or strip silicon wafers without the use of harsh chemicals. Thus this process is lower in cost and is also more environmentally-friendly.

Oxide Strip (Buffered Oxide Etch - BOE)
Modutek’s F Series filtered sub-ambient circulation baths for BOE applications can reduce acid use while removing particles and improving yields.

Solvent-Based Resist Strip
Modutek's SFa series temperature-controlled stainless steel recirculating baths can support a vast range of solvents such as IPA, acetone and resist strip solutions.

SPM Photo Resist Strip
Modutek's QFa high temperature recirculation quartz baths can handle photo resist strip using sulphuric acid and hydrogen peroxide mixture for the SPM processes.

Process engineers who are considering various silicon wafer strip solutions can rely on Modutek to provide the appropriate wet processing equipment for their application. For a free consultation or quote on selecting equipment for specific wafer strip applications call Modutek at 866-803-1533 or email Modutek@modutek.com. You can read more details about Modutek’s silicon wafer solutions by reading the article entitled “Silicon Wafer Strip Solutions for Wet Processing Equipment Applications.”

How Modutek Supports Customers Using Semiconductor Manufacturing Equipment

Modutek Corporation tailors its line of semiconductor manufacturing equipment to meet the specific requirements for each client. Modutek's experienced service teams and customer support ensures that their equipment installations perform efficiently, deliver high throughput and experience low levels of downtime. Here are the ways Modutek supports customers using its wet processing equipment:

1. Equipment testing
Modutek conducts final acceptance testing (FAT) of equipment at its facilities in San Jose, CA. Clients can come to Modutek’s facility during this verification process to review of the final testing. Customer site acceptance testing (SAT) includes onsite start-up training with experienced Modutek personnel showing operators how the equipment works. In addition follow up operational training can be provided to facility managers and any other customer personnel.  

2. Service contracts
Modutek provides service contracts to make sure that the equipment is operating optimally and that all controls and adjustments work according to specifications. Modutek offers service contacts for both new and used equipment.

3. Preventive maintenance contracts
Modutek offers preventive maintenance contracts to help ensure that the client's equipment is continues to work optimally. Service checks on Modutek’s equipment as well as equipment of some competitors can are done to detect problems that could slow production, affect quality or lead to unexpected downtime.

4. Field service and support
Besides testing, training and service contracts, Modutek also offers field service for customers who are in need for repairs or upgrade for their equipment, or for clients who want more customizable parts to facilitate the improvement of their process.

To learn more about how Modutek can support your company’s needs read the complete article on the site titled “How Modutek Supports Customers Using Semiconductor Manufacturing Equipment.” You deserve quality service and support from your semiconductor manufacturing equipment supplier. Call Modutek to get free quote or consultation at 866-803-1533 or send an email to Modutek@Modutek.com.  

How the Ozone Cleaning Process Improves Silicon Manufacturing Yields

Compared to the traditional cleaning process, the ozone cleaning process (using water or a mild acid) can clean or strip wafers faster and more cost-effectively. Modutek Corporation has developed its own Advanced Ozone Cleaning Process which doesn't necessitate the use of expensive cleaning solutions and eliminates waste while improving the cleaning process.

The ozone cleaning process works by providing cleaner silicon wafers with decreased particle amounts. For example, in Modutek's DryZone gradient dryer, the process cleanses substrates with DI water to eliminate inorganic impurities before exposing them to ozone in an ozone chamber. The result is a cleaner substrate surface -- free from impurities and moisture and become stable hydrophilic surfaces.

The wafers in Modutek's Organostrip process are exposed to an organic solvent incorporated with ozone at room temperature. This technology yields very high ozone solubility in the liquid. It results in faster resist removal. All types of tested metals (including aluminum, copper, gold, tantalum and titanium) are compatible in this process.

The ozone cleaning process has many advantages over the Piranha process. These advantages include more rapid processing, better compatibility with metals, fewer particles on the surfaces, improved safety, and lower operating costs.

Discover more about the Ozone Cleaning Process by reading the recent article titled “How the Ozone Cleaning Process Improves Silicon Manufacturing Yields” on Modutek’s website. For a free consultation or quote on using Modutek’s ozone cleaning process to improve your manufacturing yields, call 866-803-1533 or email modutek@modutek.com.

Silicon Wafer Cleaning Solutions for Wet Processing Applications

Modutek Corporation designs, manufactures, and delivers standard as well as customized silicon wafer cleaning equipment for semiconductor manufacturing facilities and research labs. Their silicon wafer cleaning equipment provides effective and efficient contaminant and particle removal to promote high yields and improved throughput. The following cleaning processes are supported:

• RCA Clean - This is based on a cleaning system developed by RCA Corporation. The solution consists of water, ammonium hydroxide, and hydrogen peroxide in appropriate amounts. The system removes organic impurities and leaves a thin layer of oxidized silicon on the silicon wafer's surface.
• Standard Clean 1 and 2 - This process prepares the silicon wafer for the next processing. The RCA cleaning process is carried in two steps:
  1. Standard Clean 1 (SC1) - It uses AMP (ammonia/peroxide mixture) solution of the RCA cleaning method to remove the organic particles.
  2. Standard Clean (SC2) - It uses the HPM (hydrochloric acid/hydrogen peroxide mixture) solution to remove metallic ions. These two steps prepare the silicon wafer for additional processing.
• Piranha Etch Clean - This cleans hard-to-remove or large amounts of organic materials. The solution -- consisting of hydrogen peroxide and sulfuric acid in measured amounts -- is used to clean silicon wafers and hydroxylate surfaces. This mixture is highly corrosive and needs to be handled with caution.
• Pre-diffusion Clean - This is the final and very critical step before the silicon wafer goes into the diffusion furnace. Make sure that the wafer is completely free from contaminants and particles; otherwise they would disrupt the diffusion process and will lead into a low-quality or defective semiconductor output.

For more details on the wafer cleaning solutions supported by Modutek read the article titled "Silicon Wafer Cleaning Solutions for Wet Processing Application" on the website. If you want a free consultation or quote on selecting Silicon Wafer Cleaning Equipment for your application, call 866-803-1533 or email Modutek@Modutek.com.

Tips on Selecting the Right Options for Your Wet Bench Equipment

Modutek wet benches consist of white polypropylene construction with 304 stainless steel construction available for solvent applications. They can be built to any size and length depending on a customer’s requirements. The wet benches include safety features such as safety interlocks, emergency power off buttons, PVC safety shields, and wiring to NFPA 70 and 79.

Fully-automated wet bench stations use SolidWorks Simulation Professional and SolidWorks Flow Simulation software to optimize the semiconductor fabrication process and its performance. This eliminates human operator error by calculating the chemical dosage and operating the station to optimize process performance.

Semi-automated stations have some of the advanced features and precision of an automated station without the higher cost of the fully automated station. Customers can enjoy the benefits of process uniformity and precision of robotic controls as well as the SolidWorks Professional and Flow software at a reduced cost.

Manual wet benches are the most cost-effective way to get the safety features and operating characteristics of the Modutek wet process equipment family. These stations provide an effective start for customers to use wet process equipment. They can later add more automation features into these stations.

Solvent stations have a 304 stainless steel construction with fire suppression. They are available with the same fully automated, semi-automated and manual station options as Modutek’s other wet processing stations. These are for customers with applications that use acetone or IPA or want to do photo resist stripping or EDP etching.

Time-saving dry to dry wet process equipment removes transfers and increases throughput and yield. Customers who want to simplify this process may choose this equipment. Read more details in the article on the site titled “Tips on Selecting the Right Options for Your Wet Bench Equipment.”

Advantages Modutek Offers over Other Semiconductor Equipment Manufacturers

For over 35 years, Modutek Corporation has been an industry leader in developing wet process equipment and related components including wet bench stations, nitride etch baths, high temperature quartz-heated baths, sub ambient filtration, rinsing systems and chemical delivery systems.

Throughout its 35 year history as a semiconductor equipment manufacturer, Modutek is known for high quality and reliability of its products. The company employs highly skilled engineers who use the latest technology and innovation to improve process automation. Modutek leverages its expertise to deliver solutions that address the needs and requirements of each customer. Plus, it does not subcontract out the manufacture or assembly of its products -- Modutek produces, develops and designs its own equipment in house.

Another key part of Modutek's success is excellent customer support, which is not only available but is also of unequaled expertise because all equipment and software is manufactured in its main office location in San Jose, California.

Modutek's long history of providing customized and high quality equipment has made it a preferred supplier among semiconductor equipment manufacturers. Learn more about these advantages by reading the article on the main site titled “Advantages Modutek Offers over Other Semiconductor Equipment Manufacturers.”

Modutek Receives Order for Single Chamber HF Last/IPA Vapor Dryer

Modutek Corporation has just received a customer order for a new innovative IPA vapor dryer. It includes HF (hydrofluoric acid) injection as a first procedure before moving on to the standard IPA vapor drying process. This step leads to the oxide etch to bare silicon. The hydrophobic wafers are then rinsed to pH controlled level. When the pH reaches the appropriate level, the IPA vapor dry process starts in the same chamber. This eliminates the need to move the Hydrophobic wafers to a separate drying station. The new IPA vapor dryer improves yields by minimizing or entirely removing water spots and reduces the defects by particle neutral-drying.

Modutek’s IPA vapor dryer features a single drying chamber for DI water rinsing and IPA vapor drying. It also has an onboard HF metering which controls mix ratios with precise measurements. The oxide etch with the IPA vapor drying uses a process with rinsing controlled pH before the IPA drying cycle starts. It also includes a filter bypass for contamination control. The IPA vapor's standard one-gallon bottles are also easy to change at deck level and the top entry of the IPA vapor guarantees even distribution. The absence of moving parts in the dryer will ensure no breakage of the wafer.

Modutek's dryer cycles last from 10 to 15 minutes and has reduced consumption on IPA. Modutek also does custom installations and thus can do designs of the IPA dryer to meet various requirements of any application. The entire press release article can be read from the following link: http://www.modutek.com/modutek-receives-order-for-single-chamber-hf-lastipa-vapor-dryer/

What Fume Scrubbers Do and the Benefits They Provide

Manufacturing processes that include semiconductor etching or parts cleaning with strong chemical solutions create exhaust fumes containing process chemicals in gas or droplet form. Such fumes are dangerous to the human health and are also corrosive to machinery.

Environmental regulations also require that exhaust fumes created must be neutralized before they can be released into the atmosphere. Modutek's Fume Scrubbers use a wet packed bed to remove acid and base chemical traces in chemical process exhaust fumes. The exhaust fumes pass through a wet packing material. The chemicals are removed when they come in contact with the neutralizing solution from the beds, therefore dissolving the harmful gases. These gases are then effectively neutralized and are no longer present into the air. Manufacturers know their employees are safe because there are no hazardous chemical fumes.

Modutek manufactures Scrubbers that come in custom sizes and in a wide range of air handling capacities from 500 CFM to 25,000 CFM. Each unit is designed to meet the air quality standards of the customer. Modutek’s Fume Scrubbers are highly efficient and designed for low-cost of operation and low water usage. Automatic pH control of the scrubber water provides optimized operation and allows removal of acid and base chemical fumes of up to 99 percent. The scrubbers utilize material from packing media industry leader Lantec which optimizes the surface area of the scrubber solution exposed to the fume gases and keeps water usage to a minimum.

To learn more about Modutek’s Fume Scrubbers, and their benefits, read the complete article titled “What Fume Scrubbers Do and the Benefits They Provide”. 

Silicon Wafer Cleaning: Effectively Removing Contaminants to Improve Yields

The key to successful semiconductor manufacturing is the effective cleaning of silicon wafers during various stages in the manufacturing process. The equipment and processes used in silicon wafer cleaning needs to effectively remove impurities, contaminants, and residues to ensure that the manufactured components meet the required functionality and quality. Modutek’s silicon wafer cleaning equipment helps to optimize yields and uses the most advanced cleaning processes to produce high-quality results.

RCA Cleaning - Consists of immersion of the silicon wafers in hot acidic acid and alkaline cleaning solutions.

Megasonic Cleaning - Complements RCA Cleaning with the use of megasonic cleaning technology that produces cavitation bubbles to remove microscopic particles that create component defects.

SPM Clean-Piranha Etch – This is used in cleaning heavily contaminated and clearly visible contaminants in silicon wafers. Hydrogen peroxide and sulphuric acid are the cleaning solutions.

FFEOL and BEOL processing - Front End of Line (FFEOL) processing is a part of semiconductor manufacturing where the components are created in a semiconductor wafer. The Back End of Line (BEOL) involves depositing the metallic interconnections.

Modutek specializes in silicon wafer cleaning equipment for the semiconductor manufacturing industry and provides a complete line of semiconductor cleaning solutions. In addition to chemical cleaning stations Modutek incorporates the use of Megasonic cleaning equipment and IPA vapor dryers. You may learn more about “Silicon Wafer Cleaning: Effectively Removing Contaminants to Improve Yields” by reading the blog article on the site.

Certifications and Support for Wet Benches and Wet Processing Equipment

Wet benches and wet processing equipment used in semiconductor manufacturing use chemical processing and electrical systems that must be designed to meet industry certifications and compliance standards. Modutek Corporation ensures that their products are designed and manufactured to meet applicable industry standards and also meet the specific requirements of each customer.

Certifications of compliance with applicable standards are a key factor that provides customers the confidence that the equipment they buy is well designed and safe to use in a manufacturing environment. The applicable certifications of compliance include the following:

UL508a Standard for Industrial Control Panels - Defines safety features like protection against live electrical parts and grounding of electrical equipment. The electrical panels in Modutek’s equipment are wired in accordance to this code.

NFPA 70, NEC - Deals with the safety of the design, installation and inspection of electrical systems, and concerns with the current environment and operating conditions of the installation. It also specifically addresses systems in hazardous locations. Modutek’s wet bench stations are wired to fully comply with NFPA 70 and the NEC which provides a high level of safety and operational reliability.   

NFPA 79 - Regulates the electrical safety of industrial machines, as well as their operation. Modutek’s wet benches comply with this standard as well as being designed to provide safe, reliable operation.

In addition to adhering to these standards, Modutek can also supply third-party certification for the above standards as well as for SEMI S2/S8 Safety Assessment, Ashare 110 Fume Hood Testing, AS/NZS3000: 2007 (Australian/New Zealand Standard), CE Mark (European Testing), CSA (Canadian Standards Association). The company guarantees warranty support and excellent customer support for service, repairs, and customization as well, to make sure that clients are completely satisfied with the company's products. For more information read the blog article published on the site titled “Certifications and Support for Wet Benches and Wet Processing Equipment”.

How Quartz Baths Are Used in a Manufacturing Process

The manufacture of semiconductor components involves cleaning, stripping, and etching of semiconductor wafers. Since this process requires the use of corrosive chemicals such as sulfuric or hydrochloric acids, a well-designed quartz bath should be the effective solution because it withstands such chemicals even in high temperatures. A high-quality quartz bath should also conduct heat effectively in order to facilitate fast and even heating.

The Modutek Series QFa quartz baths are high-temperature recirculating units which use grade flame polished quartz to minimize possible contamination, as well as functions for fast and even heating.

The Modutek Qa series is made of made of internally flame polished virgin fused quartz, which is boron free. It has accurate temperature controls of 1 degree Celsius with a heat-up rate of 2 degrees C to ensure constant temperature.

Modutek's quartz baths are cost-effective but safe, reliable and efficient units to improve the process of semiconductor components.

Our recent article “How Quartz Baths Are Used in a Manufacturing Process” explains more. If you have questions, please call 866-803-1533 or email sales@modutek.com.

Modutek's Wet Bench Design Process

Modutek's services place a lot of emphasis in designing its line of wet bench equipment to meet the needs of their customer’s requirements.

While aiming to meet and exceed customer's expectations, Modutek also implements a wet bench design process as well. The resulting product should have a high throughput with a long service life and a low level of downtime.

The company has direct contact with its customers who identify the specific requirements and features they need for their equipment. Then Modutek’s personnel gather the details of the customers' application as well as develop its own criteria in order to arrive at a successful wet bench design. Modutek uses only the most advanced design tools which ensure the accuracy and precision of the models. Modutek coordinates with the customer to make sure the design, engineering, manufacturing, and integration as well as the final delivery and setup are successful. This insures that each customer will have high-quality and reliable wet bench equipment that meets (or exceeds) the requirements for their application.

Learn more about this design process by reading the article “Modutek’s Wet Bench Design Process.”