The Piranha
or SPM (sulfuric peroxide mix) solution consists of a mixture of sulfuric acid
and hydrogen peroxide. When combined in correct ratios, this solution can clean
organic contaminants and residues from wafers and oxidize most metals. The
powerful chemical action that makes it a preferred method for stripping and
cleaning of wafers also makes it hard to use. Silicon wafer
cleaning equipment is required to handle the corrosive chemicals needed to support the
piranha etch process on semiconductor wafers safely and effectively.
When a
facility wants to re-use the piranha solution, they spike it with hydrogen
peroxide which allows the piranha solution to be usable for up to eight hours
rather than replacing the solution every two hours. Spiking conserves the
sulfuric acid as well as saves money, but at the same time it requires wet
bench equipment that can support the spiking and the overall process of piranha
etching.
Modutek's
high-quality silicon wafer
cleaning solutions are specifically designed to handle corrosive cleaning chemicals and
can support the piranha etch process safely and effectively. Modutek can supply
standard equipment or customized wet benches to fit to the customer's
specifications. Piranha wafer cleaning is supported by Modutek's QFa quartz
recirculating tanks and QA constant temperature baths. Both can be installed in
a wet bench station and can be programmed and controlled manually,
semi-automatically, and automatically.
For more
information read the complete blog article titled “How Piranha Etch is
Used in Silicon Wafer Cleaning” to learn more about Modutek’s silicon wafer
cleaning equipment. You may also call or send an email to request a free quote
or recommendations for choosing the right wafer cleaning equipment for your
application.
