Modutek at 2019 Semicon Conference in China-Hall N3 Booth 3243

Modutek, a leading supplier in wet bench stations and wet process equipment, will be attending the 2019 Semicon Conference, located at the Shanghai International Expo Center in China from March 20 to 22. You will find Modutek and its factory representative Laserwort Ltd. at Booth 3243 in Hall N3.

At the conference, Modutek and Laserwort representatives will be answering and providing information regarding the use of manual/semi-automated/fully automated wet bench equipment and wet bench stations for acid/base, solvent and/or photo resist strip. Modutek will also provide information regarding their new IPA vapor dryer with the last HF process, as well as its benefits.

For over 38 years, Modutek has been designing and supplying wet bench stations and wet process equipment for clients in various industries such as semiconductor, pharmaceutical, solar and biochemical. Its products provide highly reliable and consistent results for precision processes. Modutek also provides world-class service and customer support, and it serves customers in the United States and many other countries around the world.

Modutek's experience and expertise have made them a leading name in wet bench stations and wet process equipment. For more details read the article titled “Modutek at 2019 Semicon Conference in China-Hall N3 Booth 3243”. If you would like to schedule a free consultation, contact Modutek at 866-803-1533 or email Modutek@Modutek.com

Why Chemical Lift Station Pumps Are Needed for Wet Bench Stations

When steps for wet bench processing are done, the remaining chemicals and waste water must be drained and transferred to an area for neutralization and disposal. Depending on the physical layout of a manufacturing facility, gravity draining may not be possible or insufficient due to flow or speed.  Chemical lift station pumps are required in these situations which transfers the chemical solvent in a controlled and optimized method. The use of chemical lift station pumps will enable the fast and complete removal of chemical solvents and waste liquids, leaving the wet benches ready for the new process step.

While designing new installations without lift station pumps and dependence only on gravity drains may be possible, these require facility changes that include upgrades or expansions and retrofitting of pumps. In these cases, chemical lift station pumps must be included in separate stations that are often located at the back of the wet stations. Since these separate stations take up valuable floor space dedicated to productions processes incorporating lift station pumps into new wet bench stations is a better alternative.

Modutek can incorporate lift station pumps into their existing wet bench stations and use them to pump acids, solvents and similar chemicals and solutions in their semiconductor manufacturing equipment. The lift station controls automatically monitor the lift station tanks. The installed level sensors detect the fluids in the in the tank. When the fluids are detected, the corresponding pump is activated to transfer the liquid from the processing station to the facility's neutralization area. Incorporating the lift pumps in the processing stations is an efficient and compact solution for new installations.

The complete article “Why Chemical Lift Station Pumps Are Needed for Wet Bench Stations” explains more details on the use of this equipment.  If you have questions or would like a free consultation please call Modutek at 866-803-1533 or email Modutek@modutek.com.

Why Preventative Maintenance of Wet Bench Equipment is Important

Preventative maintenance of wet bench equipment is necessary and even vital to manufacturers since it helps avoid costly and unexpected downtime due to equipment failure or qualify issues. Wet bench equipment and components are complex and are usually used in a demanding environment. Calibration, cleaning, and replacement of worn-out parts must be performed regularly to maintain facility performance and maintain or improve output quality.

Wet bench stations operate with harsh and corrosive chemicals, and there are also other variables (like temperature) which are also critical for a successful production line. Some parts must be changed, cleaned or serviced regularly while others need to be inspected regularly to determine if any action is required. Scheduling preventive maintenance that limits the downtime for the production line to a minimum while ensuring that all preventive measures are carried out can sometimes become challenging.

The semiconductor manufacturing equipment supplier should specify what preventive maintenance measures are required and which ones are recommendations. Some tasks may be done by the manufacturer's personnel, however, others will require specialists from the supplier. For some lines, production steps are sequential so a specific component may be temporarily at rest for a given time while preventive maintenance is done on that component.

Coordinating with a supplier (who knows about the installation and can handle all preventive maintenance tasks) will help in developing a preventive maintenance program. A supplier can help the semiconductor manufacturer develop and adopt a convenient schedule for a wet bench equipment maintenance program.

Modutek offers this type of maintenance program as part of their customer support. The company has in-house expertise based on almost 40 years of experience in the wet bench processing technology field. Scheduling and implementing a preventive wet bench maintenance program while keeping disruptions to production at a minimum requires using that experienced personnel that Modutek provides.

The complete article, “Why Preventative Maintenance of Wet Bench Equipment Is Important,” explains further about the importance of maintaining wet bench equipment you may have. Call Modutek at 866-803-1533 for a free consultation to discuss your wet bench equipment needs.

How to Safely Use Solvents for Wafer Processing

Solvent wet bench equipment is designed for operations which include substrate cleaning, photoresist stripping, and liftoff pattern transfers. The wet bench stations provide a critical role in the semiconductor fabrication process. Since solvents are often highly inflammable, wet bench equipment needs to be designed to follow stringent safety codes.

Precautions related to fire and electrical safety is some of the most basic requirements in the design of wet bench stations. There are also requirements for safety alarms, carboy collections, heated solvent baths and process timers. Only well trained and authorized individuals should access the wet bench equipment. In many cases, added safety measures from simple approaches, such as using auto-lids made of Teflon or stainless steel used for sealing off chemical containers.

Solvent applications require the use of stainless steel. Modutek's solvent stations are constructed of 304 stainless steel, which makes them suitable for photoresist, IPA and acetone which are critical operations in the wafer processing. Plus, Modutek's solid works and professional flow simulation software provide improvements in productivity.

Modutek's safety design for solvent processing involves every required feature:

• Wiring specified to meet NFPA 70 & 70 codes;
• Emergency power off design for every safety interlock;
• Lip exhausts on all solvent tanks;
• N2 head case purge design;
• Photohelic EPO interlocks;
• Safety shields;
• Teflon N2 guns;
• Continuous flow of the water manifolds;

Modutek's stainless steel solvent stations are available in manual, dry-to-dry, semi-and-fully automated designs. Wet bench design and construction is a complicated process, but Modutek ensures their systems that are designed to meet all industry safety requirements as well as the specific requirements of individual customers.  

Our full article “How to Safely Use Solvents for Wafer Processing” explains more about this topic. Call Modutek at 866-803-1533 if you have questions or would like to get a free consultation or quote.

How Wet Bench Stations Are Tailored for Specific Manufacturing Process Requirements

The fabrication of semiconductor wafers requires precise, closely controlled, and consistently-repeated procedures. These factors are critically important especially for industries that fabricate semiconductors, medical equipment, and photovoltaic cells. They require the use of custom-made wet benches designed to assist the safe and precise control of corrosive chemicals at high temperatures.

Modutek, with over 35 years of experience in wet bench stations, manufactures a full range of wet bench equipment to address the specific needs of semiconductor manufacturing facilities and research centers. Wet bench stations are tailor made based on the manufacturing requirements of each customer. Modutek’s wet bench equipment for the semiconductor industry meets all UL2360/FM4910 standards for fire and contamination safety.

Sulfuric acid-peroxide is a powerful chemical that is critical to the cleaning process applied to semiconductor wafers. Effective application of this chemical mixture is inherently unstable and therefore it needs to be constantly controlled and re-balanced to maintain efficiency.Modutek’s wet bench equipment ensures the precise chemical concentration levels are maintained and insures the most cost-effective use using an exclusive chemical re-use system.

The silicon nitride wet etching process is another semiconductor fabrication stage that is used to mask chemical etchings on silicon wafers. It also requires high precision and control. Once the etching is successfully done, the masking material should be removed. Precise control of certain chemical mixtures used in wet etching (such as phosphoric acid and DI water) will prevent the possibility of dangerous overheating and explosions. Modutek's wet bench stations are constructed with high-tech safety features and the use of precision software to address such challenges.

Read the complete article titled “How Wet Bench Stations Are Tailored for Specific Manufacturing Process Requirements” for additional information about Modutek’s wet bench stations and process control features. If you have questions or would like to discuss your wet bench requirements, please call Modutek at 408-362-2000 or email modutek@modutek.com.

Changes to the SPM Process Improves Efficiency and Results

The sulfuric acid peroxide measure (SPM) is the process that effectively strips and cleans silicon wafers, however due to the decomposition of the hydrogen peroxide it suffers from instability. Heated baths can speed up the process, but they can affect the concentration of the hydrogen peroxide. Periodically adding the mixture with extra hydrogen peroxide, on the other hand, will maintain its concentration but it can affect the strip rate. As a result, the SPM mixture needs to be changed as frequently, and leads to high costs of chemicals and frequent downtime on wet bench stations.

Modutek has addressed the SPM issues with its new “bleed and feed” spiking system, which uses a double clean-and-dirty tank process. This newSPM strip and clean process starts by draining a programmable amount of mixture prior to each process step. Next, a programmable amount of sulfuric acid is added to a clean tank. Now both tanks have the programmable amount of hydrogen peroxide.

With the “bleed and feed” method, a complete chemical change is now only required about once a week as compared to two or three times a day. It also helps in reducing downtime and enables the process to get up again quickly. Result is less frequent changes and use of costly chemicals.

The “bleed and feed” system is also PLC-controlled, and the periodic adding/spiking of chemicals enables the mixture to be used continuously for longer periods of time. In addition this updated process is more efficient in delivering better cleaning and stripping performance.

For additional details about the SPM process upgrade on Modutek’s wet bench stations, read the complete article entitled “Changes to the SPM Process Improves Efficiency and Results.” If you need more information or have questions, please send an email to modutek@modutek.com or call Modutek at 866-803-1533.

Modutek At 2018 Semicon Conference in China

Modutek Corporation, a leading provider of wet bench stations and wet process equipment, will be at the Semicon Conference in Shanghai China from March 14-16, 2018 with their factory representative Laserwort Ltd.  They will be located in Hall N2 at booth 2431. Information about the Semicon Conference can be referenced at http://www.semiconchina.org/ and details on Modutek’s attendance at the conference can be referenced at: Modutek at Semicon Conference in China

Come by the Modutek /Laserwort booth to get information and answer any questions you have about using Wet Bench Process Stations for acid/base, solvent and ozone cleaning or photo resist strip.  In addition Modutek will also provide information about the benefits of their new IPA vapor dryer with the HF last process. Modutek serves customers around the world who require any type of wet processing equipment and builds chemical delivery systems for pharmaceutical, biochemical, solar and semiconductor manufacturing.

Additional details on some of Modutek’s products are listed below:

Single Chamber HF Last IPA Vapor Dryer

Benefits include:

·         Most drying cycles completed within 10 to 15 minutes

·         Very low consumption of IPA

·         No moving parts inside drying chamber eliminating wafer breakage

·         Eliminates watermarks

·         Drying technology can be designed into wet bench eliminating one transfer step

Features include:

·         Single drying chamber for DI water rinsing and IPA vapor drying

·         On board HF metering for precision mix ratios

·         Uses an in situ HF etch process with a rinse step before the IPA drying cycle

·         Filter bypass for contamination control with no cassette contact points

·         Easy to change IPA bottles

·         Handles all process sizes (standard wafer carriers to glass substrates)

Fully-automated Wet Bench Equipment

Benefits include:

·         In house customization to meet customer process requirements

·         Precise automated process execution and reliable repeatability

·         Full automation control with touch screen

·         Improved yield and reduced errors

·         SolidWorks Simulation software for accurate calculation of process parameters

·         All robotics and software design designed in house

·         Complete design, assembly and test at one location to meet your specifications

Semi-automated Wet Bench Equipment:

Benefits Include:

·         Automation control with touch screen

·         Servo motor automation

·         SolidWorks Flow Simulation software

·         SolidWorks Simulation Professional software

·         All robotics and software designed and developed in house

·         Complete design, assembly and test at one location to meet your specifications

Manual Wet Bench Equipment:

Benefits Include:

·         High end manual equipment at competitive pricing

·         Meets or exceeds all current safety standards

·         Low cost of ownership

·         Designed to meet any process requirements

·         Can accommodate custom designs and processes

·         Equipment designed for future expansion

All wet bench equipment supports the following applications:

• KOH Etching
• Quartz cleaning
• Ozone Strip
• Ozone Cleaning
• SC1 & SC2 (RCA Clean)
• Megasonic Cleaning
• BOE (Buffered Oxide Etching)
• MEMs processing
• All solvent applications
• Hot phosphoric (Nitride Etching)
• SPM Cleaning
• Precision Part Cleaning

Modutek has over 37 years of industry experience and expertise in developing and building wet bench stations and wet process equipment that provides highly reliable results for precision processes. They also provide world-class service, and customer support. Contact Modutek at 866-803-1533 or email Modutek@Modutek.com for a free quote or consultation to discuss your requirements.

Determining Which Wafer Processing Station Will Meet Your Requirements

Wet benches stations are available in various configurations which are designed for different applications. Because of this, clients may have a difficult time deciding which equipment to choose that will best meet their requirements. One way to reduce the uncertainty and to make the selection more defined is to focus on three areas where your requirements must be met.

A wafer processing station needs to address the following items: 

1) Compliance with standards
Wet bench stations should comply with the following industry standards to ensure safe operation and resistance to combustion:

• NFPA – National Fire Protection
• NFPA 79 – Safety of Industrial Machinery
• NEC – National Electrical Code
• UL 508a – Standard for Industrial Control Panels

If wet bench stations have to be installed outside the US, Modutek is also able to comply with a foreign country's own local and national safety standards. In addition, Modutek can supply third-party certification for compliance.

2) Applications
Modutek can supply the right systems and advise on the benefits and advantages of certain products from their complete line of wet bench equipment, depending on the process or application required.

3) Automation
Modutek offers manual, semi-automated and fully automated wet bench stations. You should know your needs first before deciding whether you want a manual or automated model:

• Manual – ideal for low volume custom or prototype device processes. It has the most competitive pricing among the three models.
• Semi-automated – has some automated features and provides uniform processing without the higher priced associated with fully-automated models
• Fully automated – ideal for hands-off operation and higher volume with standard processes. It improves higher throughput and minimizes human errors.

Modutek's wafer processing stations are developed and manufactured with the same high-quality materials but it can also supply the appropriate degree of automation that will meet the customer’s needs and specifications.

Read our complete article entitled “Determining Which Wafer Processing Station Will Meet Your Requirements”. If you have questions after reading it, please give Modutek a call at 866-803-1533 or send an email to modutek@modutek.com. 

Improving Process Control with Fully Automated Wafer Fabrication Equipment

An increasing number of wafer fabrication applications require tight process control. Accurate chemical dosage and precise process timing become critical for a high-quality output.

Manual and semi-automated controls are susceptible to human error and a variation in how process steps are carried out. These processes can be improved with the use of fully-automated wet benches and chemical stations which help with consistent execution.

The combination of fully automated wafer fabrication process and software ensures better repeatability, minimized waste and improved production line performance.

Modutek designs and manufacturers their fully automated wafer fabrication equipment in-house to ensure the highest quality standards are met. In addition, Modutek has developed their own SolidWorks Simulation Professional and SolidWorks Flow Simulation software, which will provide a consistent automated process and ensure correct dosages. The software can also perform simulations and track chemical use.

Modutek offers standard wet bench chemical stations or customized equipment to meet the customers' exact standards and specific application. They can handle both solvent and acid applications, and the equipment can process sizes up to 30 inches by 60 inches.

There are a number of benefits in using fully automated wafer fabrication equipment. The process is set up and can be run repeatedly with minimal monitoring. It also allows for improved process control and accurate chemical dosage, precise timing of process steps, exact replication of the process sequence, and full neutralization of chemical waste. A fully automated process also reduces the use of chemicals. Process output remains consistent, the number of defective results is low, and production line and productivity are improved.

Read the entire article “Improving Process Control with Fully Automated Wafer Fabrication Equipment” and then call Modutek at 866-803-1533 to get a free consultation. You may also send an email to Modutek@modutek.com with any questions you may have.

Upgrading Used Semiconductor Manufacturing Equipment and Wet Benches

As long as existing semiconductor manufacturing equipment or wet benches are not near the end of their useful life, it is often more practical to upgrade them than to buy new equipment.

When the equipment experiences a downtime, it may be a good time to replace key components while the entire subsystems can be upgraded during scheduled maintenance to prevent further downtime. Upgrading and retrofitting the used equipment with new components as well as repairing their defective parts can result in extended useful life for wet benches and related equipment. Upgrades can also help further increase throughput, improve safety, ergonomics, ease of operations, and chemical delivery system performance. If you want your equipment to be able to handle larger wafer sizes, upgrades are also the way to go.

Modutek has many years of experience and expertise in upgrading existing wet benches and other related equipment -- whether it's their own or from another manufacturer. Among the equipment upgrades Modutek can provide:

·         Identifying and replacing defective or obsolete parts with new or retrofitted components

·         Updating robotics, baths, and wet etching components

·         Upgrading motion controls and software

·         Redesigning and improving systems within an existing footprint

·         Re-conditioning existing systems to improve performance

Upgrading brings a lot of benefits, including the opportunity to upgrade semiconductor fabrication equipment from manual to semi-automatic or a fully automatic configuration to improve consistency and reduce operational errors. Modutek can determine whether such upgrades or retrofits are feasible by evaluating the performance of their older models (or units from some other manufacturers) and then performing the appropriate work.

For more information, please read the complete article titled “Upgrading Used Semiconductor Manufacturing Equipment and Wet Benches”. If you have additional questions or would like to discuss your specific needs, call 408-362-2000.

How Piranha Etch is Used in Silicon Wafer Cleaning

The Piranha or SPM (sulfuric peroxide mix) solution consists of a mixture of sulfuric acid and hydrogen peroxide. When combined in correct ratios, this solution can clean organic contaminants and residues from wafers and oxidize most metals. The powerful chemical action that makes it a preferred method for stripping and cleaning of wafers also makes it hard to use.  Silicon wafer cleaning equipment is required to handle the corrosive chemicals needed to support the piranha etch process on semiconductor wafers safely and effectively.

When a facility wants to re-use the piranha solution, they spike it with hydrogen peroxide which allows the piranha solution to be usable for up to eight hours rather than replacing the solution every two hours. Spiking conserves the sulfuric acid as well as saves money, but at the same time it requires wet bench equipment that can support the spiking and the overall process of piranha etching.

Modutek's high-quality silicon wafer cleaning solutions are specifically designed to handle corrosive cleaning chemicals and can support the piranha etch process safely and effectively. Modutek can supply standard equipment or customized wet benches to fit to the customer's specifications. Piranha wafer cleaning is supported by Modutek's QFa quartz recirculating tanks and QA constant temperature baths. Both can be installed in a wet bench station and can be programmed and controlled manually, semi-automatically, and automatically.

For more information read the complete blog article titled “How Piranha Etch is Used in Silicon Wafer Cleaning” to learn more about Modutek’s silicon wafer cleaning equipment. You may also call or send an email to request a free quote or recommendations for choosing the right wafer cleaning equipment for your application.

How the SPM Clean Process is Supported in a Wet Bench Process

Semiconductor manufacturing involves the use of many processing procedures, which include cleaning silicon wafers using wet bench technology.

The sulfuric peroxide mix (SPM) solution uses 3 parts sulfuric acid and 1 part of hydrogen peroxide at about 130 degrees Centigrade to remove any organic material and photoresist from silicon wafers fast and effectively. Process engineers using the SPM clean process in semiconductor fabrication need to ensure that the chemical ratio and temperature are maintained within the safety confines and that the wafers and the solution are safely contained in impervious baths.

Modutek's wet benches support the SPM process in their manual, semi-automatic and fully automatic versions. These wet bench stations are also available in a wide range of configurations, and the designs can be customized.

In quartz recirculating baths, the SPM solution has to be heated quickly in a bath that can tolerate high temperatures and will not react with the strong chemicals. Heating has to be controlled and even, because at high temperatures the hydrogen peroxide would disintegrate and the solution has to be spiked with more peroxide to maintain its concentration.

Modutek's quartz baths support all the requirements for the SPM process. These quartz baths have an operating temperature that range from 30 to 180 degrees centigrade and feature a standard heat up rate of 2 degrees centigrade a minute. The operating temperatures can be regulated to within plus or minus one 1 degree centigrade. The liquid level sensor feature is optional. The tanks are available in standard sizes and depths, but they can also be customized as well.

Modutek's wet bench stations and quartz baths are cost-effective, designed to reduce errors as well as to improve performance, leading to higher throughput and better output quality. For a free consultation or to get a quote, contact Modutek or email Modutek@modutek.com. For more details read the complete article titled “How the SPM Clean Process is Supported in a Wet Bench Process”.

How Megasonic Cleaning Technology Improves Silicon Wafer Yields

Silicon wafer cleaning is an essential and critical part of semiconductor manufacturing. Particles must be removed from the wafer substrate during processing without damaging the delicate microcircuit structures. This will result in defective semiconductor components or low-quality output.

In megasonic cleaning systems, a megasonic frequency generator creates high-frequency sound waves in a liquid via a transducer which is submerged in a cleaning tank. The sound waves are compression waves that appear either in high-frequency peaks or low-frequency troughs. The low-frequency troughs produce cavitation bubbles which break down in high-pressure peaks. These bubbles provide the cleaning action for removing contaminants that are on the surface of the wafer. Low ultrasonic frequencies (20 to 40 kHz) produce large, high-energy bubbles which clean more robust surfaces, while high ultrasonic frequencies produce smaller bubbles, ideal for cleaning delicate components.

The megasonic cleaning technology used in the process will effectively remove sub-micron particles and contaminants without damaging or altering the wafer's surface. Selecting the right frequencies and power levels is essential for effective cleaning results. Modutek incorporates the Kaijo Corporation high-frequency Megasonic Cleaning technology into its wet bench process equipment.

Kaijo's megasonic generators in Modutek’s wet benches operate at 950 kHz in the standard version. Other frequencies are also available for a variety of cleaning applications. Modutek has included Kaijo's megasonic cleaning system in both direct and indirect bath designs. Semiconductor facilities can use Modutek's wet benches which incorporate the use megasonic cleaning technology to effectively improve yields. Benefits of using the technology include faster cleaning time, higher cleaning effectiveness, and lower use of costly chemicals and their disposal.   

If you have questions about using Modutek’s wet bench stations which incorporate megasonic cleaning technology, call Modutek or email Modutek@modutek.com. For more details read the the full-length article entitled “How Megasonic Cleaning Technology Improves Silicon Wafer Yields.”