How the IPA Vapor Dryer Provides Superior Wafer Processing

After etching and rinsing, an IPA (isopropyl alcohol) vapor dryer can produce dry silicon wafers without watermarks and limited particle adders. IPA drying is also known as Marangoni drying, relies on the Marangoni effect of low surface tension of IPA compared to water.

When IPA vapor is introduced into the drying chamber in an IPA vapor dryer, a surface tension gradient is established between the IPA and water on the surfaces of the silicon wafers. The surface tension gradient causes water to flow off the silicon wafers and they are left clean and dry. In addition, the slow drain of water feature also helps to minimize particles that contaminate the wafer surfaces. It results to clean wafers after a final etch and before the next semiconductor manufacturing step.

IPA vapor dryers are particularly suitable for drying thin, delicate silicon wafers. It dries the wafers without moving them, unlike in other drying methods, and they are not subjected to any stress. As a result, any damage is minimized while the drying performance remains excellent.

The IPA vapor dryer improves wafer processing after the final hydrofluoric acid etching. The wafer has to be rinsed with de-ionized water and dried before undergoing the next manufacturing step. Providing a clean wafer with a low particle count is crucial at this stage because the following process steps will be affected by the presence of leftover contamination or particles. Because IPA vapor dryers remove water from the water surface and reduce particle counts with the Marangoni effect, the IPA vapor dryers improve wet processing equipment results and ensure higher quality output.

The complete article, “How the IPA Vapor Dryer Provides Superior Wafer Processing” goes into further detail. If you have questions, or you would like to set up a free consultation, contact Modutek at 866-803-1533 or email Modutek@modutek.com.

How the IPA Vapor Dryer Improves Wafer Processing Results

Silicon wafers require cleaning, rinsing, and drying at certain stages of the fabrication process. The results need to be as flawless as possible, leaving no watermarks and only minimal particle contamination. However incorrect cleaning and drying may lead to contamination, which can cause serious product malfunction and high failure rates. That’s why many semiconductor manufacturers and research facilities use an IPA Vapor Dryer.

Simple methods like rapid spinning and heat drying will no longer work with the latest high-density wafers. Since water is hard to remove from these complex shapes, drying without leaving watermarks is essentially impossible.

This is why cleaning with isopropyl alcohol (IPA) is necessary. IPA drying using the vapor method delivers wafers that are completely free of watermarks and with minimal contamination. Modutek’s IPA vapor dryer features a design which obtains high-quality results by serving IPA vapor at the upper reaches of the drying tank, which ensures the distribution is even. Since the IPA's surface tension is lower than that of water, such vapor serving introduces a gradient of surface tension where IPA meets with a layer of water on the water surface.

Using the “Marangoni drying effect” water quickly leaves the surface and leaves the surface completely dried and clean. Since water never actually evaporates, it leaves no watermarks behind. Ozone is applied into the drying tank to make sure that the drying process does not leave any trace of contamination. The process takes no longer than 15 minutes.

Modutek's in-house team of experts in IPA vapor dryer design will work with a client’s technical team to design and create IPA Vapor Dryers that will specifically meet their application requirements. Clients can also come to Modutek’s facility to review testing results and confirm the equipment will work as needed.

Read the complete article “How the IPA Vapor Dryer Improves Wafer Processing Results” to learn more about Modutek’s IPA vapor dryers. For a free consultation or quote contact Modutek at modutek@modutek.com or call 866-803-1533.

Modutek At 2018 Semicon Conference in China

Modutek Corporation, a leading provider of wet bench stations and wet process equipment, will be at the Semicon Conference in Shanghai China from March 14-16, 2018 with their factory representative Laserwort Ltd.  They will be located in Hall N2 at booth 2431. Information about the Semicon Conference can be referenced at http://www.semiconchina.org/ and details on Modutek’s attendance at the conference can be referenced at: Modutek at Semicon Conference in China

Come by the Modutek /Laserwort booth to get information and answer any questions you have about using Wet Bench Process Stations for acid/base, solvent and ozone cleaning or photo resist strip.  In addition Modutek will also provide information about the benefits of their new IPA vapor dryer with the HF last process. Modutek serves customers around the world who require any type of wet processing equipment and builds chemical delivery systems for pharmaceutical, biochemical, solar and semiconductor manufacturing.

Additional details on some of Modutek’s products are listed below:

Single Chamber HF Last IPA Vapor Dryer

Benefits include:

·         Most drying cycles completed within 10 to 15 minutes

·         Very low consumption of IPA

·         No moving parts inside drying chamber eliminating wafer breakage

·         Eliminates watermarks

·         Drying technology can be designed into wet bench eliminating one transfer step

Features include:

·         Single drying chamber for DI water rinsing and IPA vapor drying

·         On board HF metering for precision mix ratios

·         Uses an in situ HF etch process with a rinse step before the IPA drying cycle

·         Filter bypass for contamination control with no cassette contact points

·         Easy to change IPA bottles

·         Handles all process sizes (standard wafer carriers to glass substrates)

Fully-automated Wet Bench Equipment

Benefits include:

·         In house customization to meet customer process requirements

·         Precise automated process execution and reliable repeatability

·         Full automation control with touch screen

·         Improved yield and reduced errors

·         SolidWorks Simulation software for accurate calculation of process parameters

·         All robotics and software design designed in house

·         Complete design, assembly and test at one location to meet your specifications

Semi-automated Wet Bench Equipment:

Benefits Include:

·         Automation control with touch screen

·         Servo motor automation

·         SolidWorks Flow Simulation software

·         SolidWorks Simulation Professional software

·         All robotics and software designed and developed in house

·         Complete design, assembly and test at one location to meet your specifications

Manual Wet Bench Equipment:

Benefits Include:

·         High end manual equipment at competitive pricing

·         Meets or exceeds all current safety standards

·         Low cost of ownership

·         Designed to meet any process requirements

·         Can accommodate custom designs and processes

·         Equipment designed for future expansion

All wet bench equipment supports the following applications:

• KOH Etching
• Quartz cleaning
• Ozone Strip
• Ozone Cleaning
• SC1 & SC2 (RCA Clean)
• Megasonic Cleaning
• BOE (Buffered Oxide Etching)
• MEMs processing
• All solvent applications
• Hot phosphoric (Nitride Etching)
• SPM Cleaning
• Precision Part Cleaning

Modutek has over 37 years of industry experience and expertise in developing and building wet bench stations and wet process equipment that provides highly reliable results for precision processes. They also provide world-class service, and customer support. Contact Modutek at 866-803-1533 or email Modutek@Modutek.com for a free quote or consultation to discuss your requirements.

Advantages of HF-Last Etching and IPA Drying in One Chamber

After cleaning, a silicon wafer needs to be effectively cleaned and dried with no particle contamination. Clean wafers are important to avoid errors in the next processing steps to produce devices that are of superior quality and free from defects. Using the single chamber HF-last and IPA vapor dryer show a considerable reduction in wafer substrate particle counts.

By the final stage of silicon wafer cleaning, the silicon oxide layer has to be removed and the cleaned wafer dried free from contaminants. However, transferring the wafers from the HF etching process to a separate drying chamber will likely cause the wafers to pick up particles.

Modutek now has a solution to this problem: the single-chamber HF-last and IPA vapor dryer, which can help to significantly reduce the particle count on wafer substrates.

In the single chamber process, Modutek uses IPA vapor drying in a free-standing unit with one DI water rinsing and drying. This method, also called the Marangoni drying technique, results in clean wafer substrates -- having no contamination or watermarks.

Modutek has modified the IPA vapor dryer to include HF (hydrofluoric) acid injection before the start of the standard IPA vapor drying process. The HF acid injection ratio is controlled and provides an etch to bare silicon. When the silicon is etched, it is then rinsed to a controlled pH level. Once the appropriate pH levels are reached, it is then followed by the IPA drying process without moving the silicon wafers. This results in the low particle count on the wafer.

Initial field results from the single chamber HF-Last IPA dyer that Modutek has supplied to customers are showing outstanding results. Within the 0.3 to 5 micron range, fewer than 20 particles (adders) were added to etched substrates which are substantially below what was achieved in previous processes in this field trail.

For more details read the complete article “Advantages of HF-Last Etching and IPA Drying in One Chamber” to learn more about Modutek’s IPA vapor dryers. Call Modtuek at 866-803-1533 or send an email to Modutek@modutek.com if you have questions or would like to get a free consultation.

Tips on Selecting the Right Options for Your Wet Bench Equipment

Modutek wet benches consist of white polypropylene construction with 304 stainless steel construction available for solvent applications. They can be built to any size and length depending on a customer’s requirements. The wet benches include safety features such as safety interlocks, emergency power off buttons, PVC safety shields, and wiring to NFPA 70 and 79.

Fully-automated wet bench stations use SolidWorks Simulation Professional and SolidWorks Flow Simulation software to optimize the semiconductor fabrication process and its performance. This eliminates human operator error by calculating the chemical dosage and operating the station to optimize process performance.

Semi-automated stations have some of the advanced features and precision of an automated station without the higher cost of the fully automated station. Customers can enjoy the benefits of process uniformity and precision of robotic controls as well as the SolidWorks Professional and Flow software at a reduced cost.

Manual wet benches are the most cost-effective way to get the safety features and operating characteristics of the Modutek wet process equipment family. These stations provide an effective start for customers to use wet process equipment. They can later add more automation features into these stations.

Solvent stations have a 304 stainless steel construction with fire suppression. They are available with the same fully automated, semi-automated and manual station options as Modutek’s other wet processing stations. These are for customers with applications that use acetone or IPA or want to do photo resist stripping or EDP etching.

Time-saving dry to dry wet process equipment removes transfers and increases throughput and yield. Customers who want to simplify this process may choose this equipment. Read more details in the article on the site titled “Tips on Selecting the Right Options for Your Wet Bench Equipment.”

Modutek Receives Order for Single Chamber HF Last/IPA Vapor Dryer

Modutek Corporation has just received a customer order for a new innovative IPA vapor dryer. It includes HF (hydrofluoric acid) injection as a first procedure before moving on to the standard IPA vapor drying process. This step leads to the oxide etch to bare silicon. The hydrophobic wafers are then rinsed to pH controlled level. When the pH reaches the appropriate level, the IPA vapor dry process starts in the same chamber. This eliminates the need to move the Hydrophobic wafers to a separate drying station. The new IPA vapor dryer improves yields by minimizing or entirely removing water spots and reduces the defects by particle neutral-drying.

Modutek’s IPA vapor dryer features a single drying chamber for DI water rinsing and IPA vapor drying. It also has an onboard HF metering which controls mix ratios with precise measurements. The oxide etch with the IPA vapor drying uses a process with rinsing controlled pH before the IPA drying cycle starts. It also includes a filter bypass for contamination control. The IPA vapor's standard one-gallon bottles are also easy to change at deck level and the top entry of the IPA vapor guarantees even distribution. The absence of moving parts in the dryer will ensure no breakage of the wafer.

Modutek's dryer cycles last from 10 to 15 minutes and has reduced consumption on IPA. Modutek also does custom installations and thus can do designs of the IPA dryer to meet various requirements of any application. The entire press release article can be read from the following link: http://www.modutek.com/modutek-receives-order-for-single-chamber-hf-lastipa-vapor-dryer/

Modutek at Semicon Conference in China

Modutek Corporation, provider of leading-edge wet benches and wet process equipment, will have a factory representative at the Semicon Conference in Shanghai, China on March 15 to 17, 2016. Modutek will join their China Rep Laserwort in Hall N3 at booth 3401. Those who are interested in Modutek's wet benches and wet process equipment can stop by the booth to learn more about the company's Automated, Semi-Automated and Manual Wet Bench Process Stations, which feature several applications and benefits like KOH etching, quartz cleaning, ozone etching and more.

Modutek also provides IPA vapor drying and Megasonic cleaning equipment for your manufacturing applications. Aside from that, eco-friendly acid neutralization systems and air scrubbers are also all available with all their equipment.

For more information about the Semicon Conference in China, refer to this website at www.semiconchina.org. You can also read more at “Modutek at Semicon Conference in China.”

Wet Processing Equipment Applications

Modutek provides technologically advanced yet cost-effective wet processing equipment and solutions that produce high-quality output. Applications include wafer etching, cleaning, drying, metal etching and stripping. Particular solutions include KOH etch and nitride etch.

The rotary wafer etching system has the ability to etch, clean, reclaim, develop, and strip semiconductor wafers and substrates. It features a dual tank design with a transfer between tanks for etching and then cleansing or rinsing.

Modutek’s vacuum metal etcher can etch aluminum layers on semiconductor wafers with high precision. It is fully automated, and etches aluminum in a vacuum to remove hydrogen bubbles that impede the etching process and generate "snow" and bridging of the etched wafers.

Modutek’s IPA Vapor Dryer cleans dry wafers without creating water spots. It can utilize ozone in the drying chamber to remove organic contaminants. Most drying cycles can be done in 10 to 15 minutes.

Modutek's state-of-the-art wet processing equipment is designed to meet the applications of any semiconductor manufacturing or research facility with either standard products or custom-designed solutions. If you need help with selecting the right equipment for your application, contact Modutek at 866-803-1533.

How the IPA Vapor Dryer Improves Wafer Processing Time

The IPA Vapor Dryer from Modutek meets the demands of facilities and process engineers who are continually looking for ways to improve silicon wafer processing time. This system includes the SolidWorks Flow Simulation and Simulation Professional software to ensure improved operations and drying time with one or two 150-450mm cassettes or glass substrates.

Modutek’s IPA Vapor Dryer design has both rinsing and drying capabilities. This Marangoni drying system incorporates a single chamber to facilitate the final stages of the cleaning process. The system provides high throughput along with other advantages including:

·         elimination of watermarks on substrates and hydrophilic/hydrophobic films with no feature damage

·         15-minute batch drying for most applications

·         secure system interface bottle change that allows for fast, deck-level applications

The IPA Vapor Dryer also has a variety of additional safety features and optional features to provide optimal wafer processing with wet processing equipment. If you have questions, call 866-803-1533 or send an email to sales@modutek.com for answers.

Using RCA Clean in a Wet Bench Process

A wet bench process is a procedure involving the removal of organic residues from a silicon wafer and replacement of the surface layer of oxide with a new, thin layer. Semiconductor process engineers do this process first before processing silicon wafers under high temperatures.

SC-1 and the SC-2 are the solutions applied in this process.

The SC-1 removes impurities sticking to the silicon, quartz, and oxide surfaces in a 15-minute soak. It also gives way to regeneration of surface oxide layers.

After the SC-1 application, the wafer is soaked in SC-2 for 10 minutes. This eliminates other impurities such as microscopic metal hydroxides and alkali residues, ensuring that the silicon is thoroughly clean.

Modutek produces high-quality and technologically advanced wet bench processing equipment suited for RCA clean. Modutek also has IPA Vapor Dryers which can be incorporated to your wet bench and finalizes the cleaning process.

Modutek Corporation Is Featured at China's Semicon Conference

Modutek Corporation is pleased to announce that it will have a factoryrepresentative at the Semicon Conference in Shanghai, China. The conference, which will be attended by numerous exhibitors in the semiconductor manufacturing industry, is March 17-19 2015. Modutek will be at booth 3243, Hall W3, Shanghai.

Modutek will provide information and answer questions regarding their manufacturing equipment with Laserwort who is their local representative in China.

The following lists the products that will be featured in the upcoming conference:

·         Semi-automated WetBench Equipment

·         Fully-automated Wet Bench Equipment

·         IPA Vapor Dryer

Learn more about the conference by going to this website semiconchina.org

For many years, Modutek has been a top provider of semiconductor manufacturing equipment and wet bench stations. The company also provides world-class service, set-up and customer support. Contact them at 866-803-1533 or by email from their site: http://www.modutek.com/

Wet Process Equipment and Batch Etching Processes from Modutek

With over thirty years of continual experience, Modutek's wet processing equipment and service solutions, as well as their wet bench solutions and semiconductor manufacturing equipment, offer reliability and quality that provide customer satisfaction at a superior level.

Modutek's products and services are especially appropriate for facility engineers and process engineers. Often these engineers are in the market for equipment that can be relied on to provide a process that is both consistent and repeatable within the environment of high-tech manufacturing. Some customers include fabricators of semiconductors, research facilities and universities that manufacture semiconductors, LED displays, solar flat panels, hard disk drives, and products that are similar or related. Modutek’s wet processing equipment can be designed and tailored according to each customer's specific requirements by their in-house team of engineers to provide equipment that will produce the best possible results. 

Modutek’s well-informed sales team, along with the experienced engineers, work to aid you in creating an effective and affordable solution that meets your requirements. Their previous and current customers have a high rate of satisfaction and the company's excellence, quality, and reliability are well-known. This high standard applies to Modutek’s highest priority: high technology manufacturing equipment, as well as to services, training, and support.

The processes supported by Modutek's Wet Bench Equipment include buffered oxide etch (BOE), chrome etch, KOH and metal etching. Additional processes that are supported include positive resist strip, high quality acid neutralization, solar and chemical polishing, precision SC1 & SC2 cleaning, customized flat panel display, and plating guidance and services.

Modutek has a full line of high quality equipment that is supported by outstanding services to provide customers with the best results. Modutek’s wet processing equipment and service solutions include the following:

The Wafer Rotary Etching System consists of a specialized batch processor that is fully automated, as well as being safe, ergonomic, and affordable. Some of the uses for which this system can be designed include wafer reclamation, stripping, developing, and precise chemical etching, along with other processing and cleaning applications.

The Vacuum Metal Etcher is another batch processor that is fully automated. Its design is intended to provide the best results using a wet chemical etching process and is specially made to use with wafers that have aluminum surfaces. The vacuum in which the etching takes place removes the occasional hydrogen bubbles that may be created during the process to prevent them from introducing flaws or creating issues with the etching process.

The IPA Vapor Dryer handles many different drying requirements, making it a competitive option for a drying system. Because it produces optimum drying with only one drying chamber, reloads and changes are quick and easy.

Megasonic Cleaning Equipment provides a cleaning solution developed for the industries that manufacture hard disks, FPD, crystal, solar, and semiconductors. Modutek provides equipment that supports the most advanced manufacturing cleaning processes.

Modutek offers high quality cost effective solutions for companies that use wet processing equipment and semiconductor manufacturing equipment. Call 866-803-1533 if you have any questions or want a quote.

Why Your Company Should Consider Modutek's Wet Processing Equipment

Modutek has been providing top quality wet process equipment for almost forty years. The industry of chemical etching has been well served by the durability, reliability, and cost effectiveness provided by the complete product line of wet processing equipment.

The complete range of techniques used by the industry is supported. The processes that use Modutek's equipment include Metal Etch, Aqua Regia, KOH (Anisotropic Etch), HF, Piranha, Photo Resist Strip, Develop Process, Buffered Oxide Etch, RCA Clean (SC1 and SC2), Aluminum Etch, and Silicon Nitride Etch.

Modutek's wet processing equipment comes in a variety of lengths and sizes to fit the needs of your company. There are two options for construction: white polypropylene (used for processing with acids and bases) and stainless steel (for solvents). All stations include wiring per NFPA 70 & 79, an EPO mushroom button, and safety interlocks. An N2 head case purge is installed on all benches, photohelicly interlocked to the EPO. There is an included DI water manifold for continuous flow, and can be moved easily with build in casters and adjusted with levelers when the machine is in position. The manual is available both online and on paper, and a one-year warranty is provided on all equipment.

Optional features include PVC-C construction, seismic zone 4 structural certification, certification from such third parties as NFPA, NEC, or CE mark, HEPA fan filters, overhead deck lighting, three-color light towers, dedicated drains and carboys with DOT containment, and counterbalance safety shields.

Your company's needs are sure to be met through Modutek's wet processing equipment. The full line consists of automatic and manual equipment, as well as custom designs or standard. Offering a variety of options means that your company's requirements for price and safety can be met, as well as providing expansion capabilities that are built in to the high-end wet processing equipment that your company needs, both now and in the future.

Whether you are starting with a new etching station, upgrading the process you already have, or purchasing additional stations, Modutek can be of assistance to you. Modutek designs and manufactures the equipment in-house for every process. These include quartz for high temperature acid baths with filtration and circulation available, stainless steel for solvent applications with filtration and circulation, plastic for materials such as FM4910, Polypro, HDPE, Teflon, Halar, PVDF, and certified welders, and support equipment including chemical mixing, chemical collect, chemical delivery, sub-ambient systems, fume scrubber, chemical neutralizers, and IPA vapor dryers.

Over thirty-five years of operation during which Modutek has provided semiconductor, solar manufacturing, and MEMS equipment has resulted in experience that means quality and reliability for your business. Modutek partners with you to create, design, and build your custom wet processing equipment, as well as installing and maintaining it as necessary. Call us today at 866-803-1533 or visit us online at Modutek.com for more information.