Advantages Modutek Offers over Other Semiconductor Equipment Manufacturers

For over 35 years, Modutek Corporation has been an industry leader in developing wet process equipment and related components including wet bench stations, nitride etch baths, high temperature quartz-heated baths, sub ambient filtration, rinsing systems and chemical delivery systems.

Throughout its 35 year history as a semiconductor equipment manufacturer, Modutek is known for high quality and reliability of its products. The company employs highly skilled engineers who use the latest technology and innovation to improve process automation. Modutek leverages its expertise to deliver solutions that address the needs and requirements of each customer. Plus, it does not subcontract out the manufacture or assembly of its products -- Modutek produces, develops and designs its own equipment in house.

Another key part of Modutek's success is excellent customer support, which is not only available but is also of unequaled expertise because all equipment and software is manufactured in its main office location in San Jose, California.

Modutek's long history of providing customized and high quality equipment has made it a preferred supplier among semiconductor equipment manufacturers. Learn more about these advantages by reading the article on the main site titled “Advantages Modutek Offers over Other Semiconductor Equipment Manufacturers.”

Silicon Wafer Cleaning: Effectively Removing Contaminants to Improve Yields

The key to successful semiconductor manufacturing is the effective cleaning of silicon wafers during various stages in the manufacturing process. The equipment and processes used in silicon wafer cleaning needs to effectively remove impurities, contaminants, and residues to ensure that the manufactured components meet the required functionality and quality. Modutek’s silicon wafer cleaning equipment helps to optimize yields and uses the most advanced cleaning processes to produce high-quality results.

RCA Cleaning - Consists of immersion of the silicon wafers in hot acidic acid and alkaline cleaning solutions.

Megasonic Cleaning - Complements RCA Cleaning with the use of megasonic cleaning technology that produces cavitation bubbles to remove microscopic particles that create component defects.

SPM Clean-Piranha Etch – This is used in cleaning heavily contaminated and clearly visible contaminants in silicon wafers. Hydrogen peroxide and sulphuric acid are the cleaning solutions.

FFEOL and BEOL processing - Front End of Line (FFEOL) processing is a part of semiconductor manufacturing where the components are created in a semiconductor wafer. The Back End of Line (BEOL) involves depositing the metallic interconnections.

Modutek specializes in silicon wafer cleaning equipment for the semiconductor manufacturing industry and provides a complete line of semiconductor cleaning solutions. In addition to chemical cleaning stations Modutek incorporates the use of Megasonic cleaning equipment and IPA vapor dryers. You may learn more about “Silicon Wafer Cleaning: Effectively Removing Contaminants to Improve Yields” by reading the blog article on the site.

Evolution of Semiconductor Manufacturing and Wafer Fabrication Equipment

Over the past two decades, semiconductor manufacturing equipment like wafer processing systems or wet bench stations have changed considerably. They are more efficient in improving repeatability and increasing throughput while they process larger wafers that contain etching structures with smaller geometries and component parts that are more detailed.

Automation of wafer fabrication equipment to operate these processes is more complex and environmental factors have now become crucial. Modutek Corporation has played a vital role in this evolution by continuing to be at the leading edge of technical development and innovation.

Modutek's semiconductor manufacturing and wafer fabrication equipment has continued to provide continuous improvements and innovations. Modutek’s equipment has enhanced the process that leads to increased productivity. Its development of automation systems has also led to fewer errors while allowing semiconductor manufacturing systems to achieve better repeatability.

For more details read the complete blog article on Modutek’s site: The Evolution of Semiconductor Manufacturing and Wafer Fabrication Equipment. If you need high quality and reliable wet benches or wafer fabrication equipment, contact Modutek at 866-803-1533 or send an email to Sales@Modutek.com to discuss your specific needs.

Wafer Processing Equipment To Meet Your Specific Requirements

Wafer processing equipment is needed by every semiconductor manufacturer and research facility. It provides optimum results for the continually shrinking geometries of integrated circuits. Semiconductor wafer manufacturing requires the use of durable and technologically-advanced wet bench stations that provide optimum yields with the lowest number of circuit defects.

Modutek Corporation manufactures all types of silicon wafer processing equipment that uses the most advanced technology:

·         Manual - cost-efficient equipment that can be used in every clean room process.

·         Semi-automated – a lower-cost alternative to the fully-automated station that utilizes touch screen controls, servo motor robots, and three degrees of flexibility which provides complete turnkey support.

·         Fully automated – includes full automation control and optional features to ensure convenience, efficiency, and increased throughput for your silicon wafer processing equipment.

·         Rotary wafer etching system - for efficient etching, developing, stripping, and cleaning process

For over 30 years Modutek has been designing, manufacturing, and installing all types of wafer processing equipment to meet every client's specific needs and requirements. Contact Modutek at 866-803-1533 or by email sales@modutek.com if you would like a free quote or discuss your specific requirements.

Modutek Corporation Is Featured at China's Semicon Conference

Modutek Corporation is pleased to announce that it will have a factoryrepresentative at the Semicon Conference in Shanghai, China. The conference, which will be attended by numerous exhibitors in the semiconductor manufacturing industry, is March 17-19 2015. Modutek will be at booth 3243, Hall W3, Shanghai.

Modutek will provide information and answer questions regarding their manufacturing equipment with Laserwort who is their local representative in China.

The following lists the products that will be featured in the upcoming conference:

·         Semi-automated WetBench Equipment

·         Fully-automated Wet Bench Equipment

·         IPA Vapor Dryer

Learn more about the conference by going to this website semiconchina.org

For many years, Modutek has been a top provider of semiconductor manufacturing equipment and wet bench stations. The company also provides world-class service, set-up and customer support. Contact them at 866-803-1533 or by email from their site: http://www.modutek.com/

Modutek DR Series Quick Dump Rinsers for Wafer Manufacturing

The deionized (DI) water rinse cycle is one of the most critical steps in all of wafer manufacturing. DI water is likely to be the primary substance to which your product is exposed, usually more than any other fluid in the entire process. A properly effective rinsing system is a dramatic contributor to reducing particles and defect densities. We have put much time into making it affordable and simple for you to transition into our quick dump rinser (DR series). You can upgrade or install a new wet process station, and we have a plan that will work for you.

There are two major features designed into our DR series Quick Dump Rinser. These are easy installation, whether you are installing into used or new equipment, and low consumption of DI water, thanks to rinse features.

Modutek equipment offers consistent, superior rinsing. Four factors that contribute to this are DI nozzles that are strategically located to spray efficiently, bottom filling, N2 agitation, and an optional bottom fill that results in vortex agitation within the rinse tank.

The DR Series Quick Dump Rinser’s interior volume has been reduced to a size that is the minimum possible to use with the wafer cassette. This reduced volume and 360º overflow weir, along with the quick dump, remove all contaminants of all sizes quickly from the wafer’s surface and anywhere around it, resulting in no recontamination.

Modutek also offers the C15sa Rinser Controller to be used with the DR Series Quick Dump Rinser. The controller is designed specifically to provide the wafer rinse system with flexibility. The controller allows the user to program several areas, including the dump cycle, the fill cycle, the start cascade, and the spray delay. Resistivity can also be programmed and an access code is incorporated to keep the program safe from tampering.

The optional Modutek Resistivity Monitor RM30a can be used with the DR Series to rinse to resistivity. The RM30a is useful for monitoring resistivity along with temperature inside the Quick Dump Rinser. It will also monitor the wet bench’s incoming water. When the resistivity setting has been reached, the rinse cycle discontinues when the level is full inside the DR Series rinser, resulting in a process specific rinse, and keeping the DI water usage to a minimum.

Since the Quick Dump Rinser is designed by Modutek to be easily added to a wet bench regardless if it is new or used, you can upgrade very easily without adding the new wet bench cost. The savings from less DI water usage and the increase in throughput will, together, help cover the upgrade’s overall cost. More information is available about the Quick Dump Rinser from Modutek and how it can be beneficial to your wafer manufacturing process by contacting us at 866-803-1533 or Sales@Modutek.com.