Wednesday, November 30, 2016

Reducing Wafer Processing Time and Costs with a Wafer Etching System

Semiconductor fabrication and research facilities can reduce wafer processing time and cost using Modutek’s rotary wafer etching system. This automated batch processor is a compact and freestanding wet bench unit with a dual tank design. It has a carrier assembly line that takes the wafer boats into the chemical tank where it provides rotational agitation for a set time. Next, it transfers the carrier assembly to the rinse tank for rinse cycles.

Once the rinse cycle is done, the carrier can be placed in the unload position were the wafer boats can be removed for drying. The rotation of the wafers in the baths is consistent, and the transfer of the wafers from the chemical tank to the rinse tank is also made much faster.

Modutek’s wafer etching system also features a touch screen control along with programmable recipes that provide full automatic wafer processing. Its microprocessor can control up to five recipes that are programmed via the touch screen. The screen displays the use and process information.
Once the operator turns on the process, the system will take control of the carrier and transfer it via the chemical and rinse cycles according to programmed values. It can accommodate multiple wafer sizes in one toll with a rotor change and it has a production capacity of up to fifty 6-inch or twenty-five 8-inch wafers at a time. Additional system options also include the capacity to handle larger wafer sizes, a chemical filtering and re-circulating system, a gravity chemical fill system, a fume condenser, and a heating/cooling system in the process tank.

Modutek's Rotary Wafer Etching System helps in reducing wafer processing time and costs. It delivers the chemical etching, stripping, cleaning, and developing solutions for semiconductor wafers or substrates. It boasts high precision, improved safety for operators and fast processing in a compact design.

Call or email Modutek Corporation at modutek@modutek.com to discuss how a wafer etching system can save your company time and money. You can also learn more by reading our entire article “Reducing Wafer Processing Time and Costs with a Wafer Etching System.”

Friday, November 18, 2016

Selecting the Right Equipment for Your Silicon Wet Etching Application

Fabrication facilities need use a semiconductor equipment supplier who can provide a wide range of dependable products to support their applications as well as meet their specific requirements.

Modutek has over 35 years of experience and expertise providing high-quality and reliable products for all silicon wet etching applications. The list below is some of the products Modutek offers to support wet etching applications.

1. Quartz Baths
Modutek's quartz baths support a wide range of etching, cleaning and stripping applications (which include the SC1 cleaning, RCA clean and SPM clean).

2. Sub-ambient Systems
Modutek's sub-ambient filtered etch baths are specially developed for BOE (buffered oxide etch) and positive resist develop applications. Various options are provided that allow customers to match the system to their requirements.

3. Temperature Controlled Circulators
The Modutek RCe Series of Temperature Controlled Recirculators are ideal for etching, plating and developing applications and constant temperature baths.  

4. Teflon Tanks
Modutek's Teflon tanks have a modular design which can be easily integrated into both new and existing
silicon wet etching stations. Available configurations include temperature controlled recirculating baths, temperature controlled static baths as well as Teflon ambient baths.

5. Nitride Etch Baths
These baths are designed and developed for exceptional process control and operation safety. Modutek designs a two-tier control system that controls the temperature while keeping the acid-to-water ratio levels by adding DI water as required.

6. Quick Dump Rinsers
Modutek's Quick Dump Rinsers provide efficient and thorough rinsing without particle entrapment with less use of DI water. They include DI water spray nozzles and N2 agitation along with consistent rinsing with bottom filling.

7. Solvent Baths
These baths are made of stainless steel tanks and are ideal for all solvent applications (which include IPA, acetone and resist strippers).


Read our complete article entitled “Selecting the Right Equipment for Your Wet Etching Application” to learn more about equipment support for your application. Contact Modutek for a free quote and recommendation on selecting for your silicon wet etching application.