Thursday, November 14, 2013

Wet Bench and Wet Bench Station Uses in Industry

Wet Bench and Wet Bench Station Uses in Industry

Wet benches and wet bench stations are the industry must-haves for all integrated circuit manufacturing. Semi-conductors, computer hardware, solar cells, and many medical components are all manufactured using this type of technology. They are particularly useful in clean room applications. Which wet bench or wet bench station option is chosen will vary, depending on the differing needs of a particular industry. Modutek Corporation is proud to offer a wide choice of wet bench stations. Options range from a basic manual wet bench to totally automated stations, with semi-automated models in between.

Modutek Corporation offers custom configuration of its already comprehensive line-up of production wet benches. We will work with your budget and your
specific needs to ensure that all of your requirements are met.

A Manual Wet Processing Station is a necessity in many, if not most, industries using clean rooms. Our manual wet stations are built to provide both acid and solvent application support. Our in-house design engineers will configure your wet bench station specifically to satisfy your exact application needs.

A few of the many advantages of Modutek Corporation’s Manual Wet Processing Stations include:

  • Being designed to meet your unique process requirements
  • Cost of ownership is lower compared to semi-automated or fully automated wet benches
  • Competitive pricing for our high end manual equipment
  • Meets, or exceeds, all current safety standards currently
  • Designed to allow for future expansion

We want your new wet station to be an exact fit to your requirements. We encourage client input and involvement on the final design before we begin the manufacturing process. Let us review the different options offered with you, to guarantee your complete satisfaction with Modutek Corporation Wet Processing Station technology.

Semi-Automated Acid Stations can also be custom configured and manufactured according to a client’s specific needs. Many options are available. We offer in-house design and manufacture to ensure that you get all of the options you want and none of those you don’t need. The semi-automated acid stations we offer have the uniform processing and robotics you need without the greater expenses of fully automated systems. The top-of-the-line, servo-controlled robots in all of our semi-automated acid stations have 3° of freedom, which allows for precise and accurate developing, etching, and/or cleaning processes.

The Modutek Corporation Semi-Automated Stations offer these and other advantages:

  • In-house software and robotics design and manufacture — no outsourcing
  • SolidWorks Flow Simulation software
  • SolidWorks Simulation Professional software
  • Automation control using a touch screen
  • Servo motor automation

Fully-Automated Acid/Base Stations offer the safety of hands-off processing. If your process necessitates complete automation, then the Modutek Corporation Fully-Automated Acid/Base Stations are the best choice. Processes from full-size 30”x 60” glass solar panels to tiny wafers can be reliably handled by our stations. Using information that your engineers specify, Modutek Corporation will configure the systems to meet your precise requirements. We never out-source so our team will be working hand-in-hand with yours to design the right wet bench station, its software, and its robotics perfect for your company’s needs.

Our Fully Automated Wafer Fabrication Equipment has these benefits:

  • Everything is completed in one place - design, assembly and testing
  • Our robotic and software design is also completed in-house, not outsourced
  • SolidWorks Simulation Professional software
  • SolidWorks Flow Simulation software
  • More than 30 years experience and continuous operation
  • Our goal is to provide outstanding customer support after the sale

For a quote or if you have any questions about any of our Wet Bench and Wet Bench Stations, call Modutek Corporation at 866-803-1533.

Learn about the Advantages of Modutek Corporation’s IPA Vapor Dryer

Learn about the Advantages of Modutek Corporation’s IPA Vapor Dryer

Using a Marangoni Drying system, more commonly called IPA Vapor Dryer, is the current gold-standard drying method in semiconductor manufacturing and related industries. Modutek Corporation’s free standing IPA Vapor Dryer system uses one standard gallon bottle, allowing quick, uncomplicated bottle changes, thus eliminating down time. There are more advantages to using the Modutek Corporation IPA Vapor Dryer.

Marangoni Drying, first developed in 1990, is now the most popular method for semiconductor manufacture. IPA vapor drying produces an ultra clean, dry surface on a wafer or flat substrate. Nitrogen gas is used to break the wetting film’s surface tension, drying the substrate while the water/IPA gradually drains around the substrate wafer. The surface dries without feature damage or a watermark, with incredibly low particle counts.

The IPA (isopropyl alcohol) Vapor drying process has these benefits:

  • Unlike spin-drying, the Modutek Corporation IPA Vapor Dryer doesn’t have moving parts, allowing the manufacture of thinner wafer substrates.
  • Particle contamination caused by evaporation residues (a common problem in spin rinse dryers) is greatly reduced using IPA Vapor Dryers.
  • The unique IPA Vapor Dryer system uses fewer chemicals than other drying processors. This reduces both the environmental impact as well as the costs of acquiring and disposing of chemicals.
  • Quicker drying times (as quick as 10 to 15 minutes) reduces productions costs, while no moving parts reduces maintenance requirements.
  • The IPA Vapor Dryer’s lower particle counts make it the superior drying process choice.
  • Outstanding for high aspect ratio structures.
  • The reduced possibility of substrate breakage during the IPA Vapor Dryer cleaning and drying process reduces production costs.
  • An IPA Vapor Dryer increases production of quality substrates. With no electro-static build up between metallic surfaces and therefore no discharge, possible damage is avoided.
  • The IPA Vapor Dryer prevents yield loss from watermarks, which is a common problem in other processes, but non existent with IPA vapor drying.

Not just the semiconductor industry, but industries dependent on them profit from the use of the IPA Vapor Drying system. Industries manufacturing products as varied as solar panels or computer disk drives, and any manufacturers using electro-chemical cells will benefit from this technology. The superior substrates manufactured by IPA Vapor Drying will be of great use to companies using micro-electronic mechanical systems (MEMS), including the medical equipment and automotive industries.

Consider Modutek Corporation’s IPA Vapor Dryer for your next drying process upgrade. Call us today at 866-803-1533 to discuss your requirements and to get a quote.

Thursday, October 3, 2013

Using Advanced Ozone Cleaning Processing for Photoresist Strip, Etch and Clean

 Using Advanced Ozone Cleaning Processing for Photoresist Strip, Etch and Clean

Companies may be spending more money than they would like for chemical disposal and chemicals. If this is the case, turn to the money-saving Advanced Ozone Cleaning Process equipment manufactured by Modutek. Our team of experienced designers will collaborate with you to create and manufacture the perfect ozone cleaning process for each company’s application.

Discover the many advantages of using Modutek’s ozone cleaning process. It has been awarded a Green Technology certificate. With it, the system can greatly reduce your process chemical dependency. The Modutek ozone cleaning process cleans, strips or etches wafers, solar devices and substrates for far less than conventional technology, often for half the normal cost.

Our technology is patented which permits the use of either Ozone or Ozone/water and mild acid to process components. This patented technology achieves the same results as expensive chemicals but in an environmentally friendly way.

See how our ozone cleaning process compares with the standard Piranha process and notice the advantages:

  • The Modutek Ozone/water cleaning process is safer because it can operate at room temperature with the same or better results. The Piranha (which uses hydrogen peroxide and sulfuric acid) reaches temperatures to 130C.
  • The Modutek system is quicker than the Piranha. It processes 100 Wafer Batches at 6 Batches per hour in each Process Tank (@1.2-1.5um)
  • This Ozone cleaning process is well-matched with a number of Metal Films. The Piranha, however, is NOT suitable for the same Metal Films.
  • The Ozone cleaning process leaves no particle or metal residue on Wafers; Piranha DOES leave them.
  • Modutek’s system is less costly to run and has an EPA Approved (Green Chemistry) certificate. The Piranha, on the other hand, is More Expensive to operate and IS NOT EPA Endorsed.
  • The Modutek Ozone cleaning solution has a lifetime of > 1 week with continuous operation. The solution used in the Piranha has a lifetime varying between 8 and 24 hours depending on the concentration of the Peroxide and Temperature it used in processing.

Break-Thru O3 Technology

  • Proven to work with Gold, Copper and Aluminum as well as Titanium, Tantalum, Tungsten and many others
  • Distributes Exact Chemistry to the Point of Use
  • Replaces 2 to 3 Traditional Wet Benches processes

Other Ozone processes replaced:

  • Metal etch
  • Resist removal
  • Surface preparation
  • Surface etch
  • Final clean

Call our office, 866-803-1533, to set up an appointment to discuss your ozone cleaning process needs. We will process a sample of your product to allow you to discover what equipment we have to offer. It is our desire to help meet your ozone cleaning process needs and we look forward to the opportunity to speak with you toward that end.

Wednesday, September 25, 2013

Silicon Etching Equipment Options

 Silicon Etching Equipment Options

Does your company use silicon etching equipment? If so, turn to Modutek. We have over 30 years experience manufacturing silicon wet etching products, along with semiconductor manufacturing equipment and ozone cleaning process equipment. You can turn with confidence to our in-house manufacturing team that will work with you to design the products you need for your applications.

Silicon wet etching, when used to make Micro-Electrical-Mechanical Systems (MEMS) components, will involve very tiny parts, often 0-100 microns in size. You will find the MEMS components in many products in a number of industries. Two of the most common industries using MEMs components are the medical and automotive industries. Some of the products that use them are MEMS accelerometers for car air bag sensors and Diabetic blood glucose meters.

Modutek offers different options for any company needing silicon etching equipment. The Sub-Ambient System (BOE), Quartz Baths, Nitride Etch Baths or Temperature Controlled Circulator are some of the equipment available. We work with you to understand your specific needs so we are able to build your silicon wet etching equipment to your specifications. We look forward to discussing your needs during our initial conversation.

  • The QFa Series Quartz Bath, a recirculation quartz bath for high temperature liquids, has these options: quartz diffuser plate, liquid level sensor, auto lid, process temperature controller, and custom vessel sizes.
  • The Qa series Quartz Bath has a 5-sided bonded circuit heating element, seamless flange design and redundant safety devices. You may also choose from the following: gravity drain, magnetic stirrer, remote operation timer switches, dilution valve system, quartz bubbler and process controller.
  • The F Series Sub-Ambient Circulation Bath, for BOE applications, allows for continuous filtration to reduce acid consumption. It has high and low temp flow sensors, N2 blanket, 120VAC, 60Hz standard electrical service, pneumatic or electrical pump, and various sizes of micron filters available.
  • The Nb Series Silicon Nitride Etch Bath was planned to supply the ultimate in process control. It is among the safest and most flexible silicon etching equipment. These are some of the options available for this equipment: pneumatically actuated auto cover, Teflon® gravity drain system, aspirator valve system, and remote operation timer switches. Learn more about the Theory of Operation document on our website.

When determining your requirements for silicon etching equipment, you will want to think about the following questions: What does the equipment need to accomplish? Will the silicon wet etching product produce what is needed? It is our goal to help you to decide if silicon etching equipment will meet your needs or if there is a different piece of equipment better suited to your application, as well as the options to help you meet your requirements.

If your company uses silicon etching equipment, and not every industry or business will, Modutek has the knowledgeable and experienced team you need. Our team will help to plan a silicon wet etching product that will best meet your company’s application and needs.

Thursday, August 29, 2013

Get to Know Modutek Corporation

If you don’t know much about Modutek Corporation or what we do, we’d like to give you an abbreviated history to help you get to know us a little better.

Modutek Corporation was founded in 1980 to manufacture wet process equipment components for the Semiconductor industry. During the past 30 plus years, we have expanded our specialties to include nitride etch baths and rinsing systems, sub-ambient filtration systems and high temperature quartz heated baths. Although we originally marketed to both original equipment manufacturers (OEMs) and the end users who purchased wet process stations.

The impact of semiconductor manufacturing on the environment came to the forefront of many in the industry during the 1990s. Modutek became proactive and purchased Shannon Engineering and then created a new environmental group called Pollution Control Laboratories (PCL), run as a Modutek Corporation subsidiary. The group manufactured acid neutralization systems, chemical delivery systems and air scrubbers. By the end of the 90s, however, the subsidiary was dropped and all systems manufactured by it were manufactured as Modutek products.

Modutek continued to expand both its acquisitions and the wet process equipment it manufactured throughout the coming years. The Vacuum Etch System (VES) and Spin Process System (SPS) were added in 2002 when Modutek acquired Sysmax, Inc. These unique systems were manufactured as a subsidiary for two years and then they were moved under the Modutek Corporation, as well.

Since 2000, the semiconductor wet process equipment manufacturing and Tech industry have undergone some downturns. Many of the processes developed and manufactured for OEM wet process bench manufacturers are now used in other Tech industries. This enabled Modutek to expand and begin offering turnkey bench manufacturing operations.

We are proud of our working relationships with existing and new customers. Together, we have been able to develop the wet process equipment they need. Some of these include the IPA vapor dryer, Ozone Cleaning process and Megasonic cleaning technology. If your business needs a clean room, facilities upgrade or specific wet process equipment, we would like to show you how we can meet your needs.