How Teflon Tanks Are Used in Wet Processing Applications

Modutek's Teflon tanks are custom-made and compatible with both new and existing wet processing stations. Their modular configuration makes it easy to install in existing clean room facilities. Modutek can also design and build specific tanks to meet a customer’s requirements. The advanced PFA Teflon welding techniques reduce contamination and undesirable by-products in the process. Heated models are also available for use in processes requiring temperature control.

Modutek's Teflon tanks are available in standard sizes (single or double capacity); the company can also build custom-sized tanks. There are also other features and functions that make the Teflon tanks ideal for various wet bench applications.

Modutek provides three types of Teflon tanks:

·         The "TT series" (ambient temperature baths)

·         The "TI series" (temperature controlled static baths)

·         The "TFa series" (temperature controlled overflow recirculating baths)

Modutek's static and recirculating temperature-controlled Teflon tanks are ideal for anisotropic etching of silicon using KOH (potassium hydroxide) and TMAH (tetramethyl ammonium hydroxide) processes. Process temperature control is accurate to within +/- 0.5 degrees centigrade and an optional Teflon refluxor with Teflon cooling coils is also available. Providing fast and accurate temperature controls lets operators achieve excellent consistency and repeatability for temperature sensitive process for TMAH and KOH etching.

Modutek’s state-of-the-art Teflon tank design, features and functions, result in fewer defects in output and a higher quality control overall. These tanks ensure uniform heating in the bath, rapid but accurate temperature control and process etch variability wafer to wafer less than 2%. Modutek also offers in house maintenance and support for the product.

Read the complete article titled “How Teflon Tanks Are Used in Wet Processing Applications” for more details. Whether you need Teflon tanks or a complete line of wet process semiconductor equipment, Modutek can help determine what the requirements are and suggest optimal equipment solutions. You may contact Modutek at 408-362-2000 for a free consultation and quote.

Tips on Improving Your Silicon Wafer Etching Process

An Improved silicon wafer etching process requires careful selection of the right etching process for the application along with the use of high-quality reliable equipment that supports consistent results.

Wafer etching is a multiple step fabrication process that requires use of different chemical baths to achieve a specific desirable outcome: The process steps include cleaning, masking, etching wafer surfaces or depositing metal. These steps produce microscopic structures in the silicon wafer and produce the required electrical connections. Key factors that contribute to improving etching performance include control of the etching speed and the cleanliness of the fabrication environment. Etching processes typically used include the following:

·         Silicon nitride - is used as a masking material and is etched with a hot phosphoric acid.

·         Piranha etching - is done with a mixture of sulfuric acid and hydrogen peroxide.

·         KOH etching - using a solution of potassium hydroxide, this etching process creates microscopic structures in the silicon.

·         Buffered oxide etching (BOE) - is carried out with a solution of hydrofluoric acid and a buffering agent to etch thin masking films of silicon nitride or silicon dioxide.

Another key factor for improving silicon etching processes is to use wet process equipment from a reliable supplier that provides equipment that meets the specific application requirements. Modutek has over 35 years of experience as an equipment supplier and can advise customers on which equipment will meet all the requirements of their wafer etching application.

While choosing the right wafer etching process for each stage of semiconductor fabrication is important, the design characteristics of the equipment itself is also key to improving etching results. Modutek's etching equipment incorporates critical design features that include:

·         Filtration and flow control

·         Temperature control

·         Tank design

Semiconductor manufacturers and research labs need silicon wafer etching equipment that delivers accurate and repeatable results in a safe and reliable environment. Modutek helps customers improve their silicon wafer etching process by advising them on the proper equipment for certain etching applications and making sure that the equipment delivers accurate and consistent results.

Read the article titled “Tips on Improving Your Silicon Wafer Etching Process” for more details. Call 408-362-2000 if you have questions or would like to discuss how Modutek can help you improve your wafer etching processes.