Tips on Selecting the Right Options for Your Wet Bench Equipment

Modutek wet benches consist of white polypropylene construction with 304 stainless steel construction available for solvent applications. They can be built to any size and length depending on a customer’s requirements. The wet benches include safety features such as safety interlocks, emergency power off buttons, PVC safety shields, and wiring to NFPA 70 and 79.

Fully-automated wet bench stations use SolidWorks Simulation Professional and SolidWorks Flow Simulation software to optimize the semiconductor fabrication process and its performance. This eliminates human operator error by calculating the chemical dosage and operating the station to optimize process performance.

Semi-automated stations have some of the advanced features and precision of an automated station without the higher cost of the fully automated station. Customers can enjoy the benefits of process uniformity and precision of robotic controls as well as the SolidWorks Professional and Flow software at a reduced cost.

Manual wet benches are the most cost-effective way to get the safety features and operating characteristics of the Modutek wet process equipment family. These stations provide an effective start for customers to use wet process equipment. They can later add more automation features into these stations.

Solvent stations have a 304 stainless steel construction with fire suppression. They are available with the same fully automated, semi-automated and manual station options as Modutek’s other wet processing stations. These are for customers with applications that use acetone or IPA or want to do photo resist stripping or EDP etching.

Time-saving dry to dry wet process equipment removes transfers and increases throughput and yield. Customers who want to simplify this process may choose this equipment. Read more details in the article on the site titled “Tips on Selecting the Right Options for Your Wet Bench Equipment.”

Advantages Modutek Offers over Other Semiconductor Equipment Manufacturers

For over 35 years, Modutek Corporation has been an industry leader in developing wet process equipment and related components including wet bench stations, nitride etch baths, high temperature quartz-heated baths, sub ambient filtration, rinsing systems and chemical delivery systems.

Throughout its 35 year history as a semiconductor equipment manufacturer, Modutek is known for high quality and reliability of its products. The company employs highly skilled engineers who use the latest technology and innovation to improve process automation. Modutek leverages its expertise to deliver solutions that address the needs and requirements of each customer. Plus, it does not subcontract out the manufacture or assembly of its products -- Modutek produces, develops and designs its own equipment in house.

Another key part of Modutek's success is excellent customer support, which is not only available but is also of unequaled expertise because all equipment and software is manufactured in its main office location in San Jose, California.

Modutek's long history of providing customized and high quality equipment has made it a preferred supplier among semiconductor equipment manufacturers. Learn more about these advantages by reading the article on the main site titled “Advantages Modutek Offers over Other Semiconductor Equipment Manufacturers.”

Modutek Receives Order for Single Chamber HF Last/IPA Vapor Dryer

Modutek Corporation has just received a customer order for a new innovative IPA vapor dryer. It includes HF (hydrofluoric acid) injection as a first procedure before moving on to the standard IPA vapor drying process. This step leads to the oxide etch to bare silicon. The hydrophobic wafers are then rinsed to pH controlled level. When the pH reaches the appropriate level, the IPA vapor dry process starts in the same chamber. This eliminates the need to move the Hydrophobic wafers to a separate drying station. The new IPA vapor dryer improves yields by minimizing or entirely removing water spots and reduces the defects by particle neutral-drying.

Modutek’s IPA vapor dryer features a single drying chamber for DI water rinsing and IPA vapor drying. It also has an onboard HF metering which controls mix ratios with precise measurements. The oxide etch with the IPA vapor drying uses a process with rinsing controlled pH before the IPA drying cycle starts. It also includes a filter bypass for contamination control. The IPA vapor's standard one-gallon bottles are also easy to change at deck level and the top entry of the IPA vapor guarantees even distribution. The absence of moving parts in the dryer will ensure no breakage of the wafer.

Modutek's dryer cycles last from 10 to 15 minutes and has reduced consumption on IPA. Modutek also does custom installations and thus can do designs of the IPA dryer to meet various requirements of any application. The entire press release article can be read from the following link: http://www.modutek.com/modutek-receives-order-for-single-chamber-hf-lastipa-vapor-dryer/