Why Preventative Maintenance of Wet Bench Equipment is Important

Preventative maintenance of wet bench equipment is necessary and even vital to manufacturers since it helps avoid costly and unexpected downtime due to equipment failure or qualify issues. Wet bench equipment and components are complex and are usually used in a demanding environment. Calibration, cleaning, and replacement of worn-out parts must be performed regularly to maintain facility performance and maintain or improve output quality.

Wet bench stations operate with harsh and corrosive chemicals, and there are also other variables (like temperature) which are also critical for a successful production line. Some parts must be changed, cleaned or serviced regularly while others need to be inspected regularly to determine if any action is required. Scheduling preventive maintenance that limits the downtime for the production line to a minimum while ensuring that all preventive measures are carried out can sometimes become challenging.

The semiconductor manufacturing equipment supplier should specify what preventive maintenance measures are required and which ones are recommendations. Some tasks may be done by the manufacturer's personnel, however, others will require specialists from the supplier. For some lines, production steps are sequential so a specific component may be temporarily at rest for a given time while preventive maintenance is done on that component.

Coordinating with a supplier (who knows about the installation and can handle all preventive maintenance tasks) will help in developing a preventive maintenance program. A supplier can help the semiconductor manufacturer develop and adopt a convenient schedule for a wet bench equipment maintenance program.

Modutek offers this type of maintenance program as part of their customer support. The company has in-house expertise based on almost 40 years of experience in the wet bench processing technology field. Scheduling and implementing a preventive wet bench maintenance program while keeping disruptions to production at a minimum requires using that experienced personnel that Modutek provides.

The complete article, “Why Preventative Maintenance of Wet Bench Equipment Is Important,” explains further about the importance of maintaining wet bench equipment you may have. Call Modutek at 866-803-1533 for a free consultation to discuss your wet bench equipment needs.

New SPM Process Provides 75% Improvement in Chemical Savings

Modutek has recently implemented the new SPM process and the company now has benchmark results from real process applications which show a significant improvement in chemical savings. The new SPM process requires the use of Modutek’s custom designed SPM process wet bench. Modutek designs and assembles wet benches and semiconductor manufacturing equipment at their facility in San Jose, California and provides systems that exactly meet their customers’ requirements.

Usually, the SPM mixture deteriorates as hydrogen peroxide turns to water and dilutes the concentration. The SPM mixture must be completely replaced at least every eight hours. This results in downtime during new mixture pour, replacement of the chemicals as well as neutralizing and disposal of the corrosive mixture in an environmentally safe way – and all these costs a lot. The SPM clean process is proven to provide results.

Modutek's “Bleed and Feed” system is designed to maintain the SPM mixture concentration automatically over extended periods. In this system, there is a “clean” tank and a “dirty” tank. A programmable amount of mixture goes out of the dirty tank, and another programmable mixture is automatically transferred from the clean tank to the dirty tank. To make up for that, an appropriate amount of sulfuric acid is added, and both tanks have hydrogen peroxide to restore and maintain the concentration.

One of Modutek’s customers that have used their semiconductor manufacturing equipment now has real life results from using the “Bleed and Feed” SPM process improvements. The results show remarkable improvements that include the reduction in volume of the following: sulfuric acid use, acid neutralizer use and chemical disposal volume. Costs in acid re-agent use are also significantly reduced. System drains are now cut down from three times a day to once a week. Downtime is not needed to drain and re-pour the mixture, and throughput is also increased. Safety is now improved due to reduced operater interaction with dangerous chemicals.

You can learn more about the new SPM Process by reading the complete article titled “New SPM Process Provides 75% Improvement in Chemical Savings.” Modutek is available to answer questions or provide a free consultation. You may reach them by calling 866-803-1533 or email modutek@modutek.com. 

Advancements in Wafer Fabrication Equipment Improve Semiconductor Manufacturing

The improvements in wafer fabrication equipment have kept up with the growing industry demands in high precision wafer fabrication. Precision is required to ensure adequate output quality and a low component rejection rate.

Automation has become the norm since it requires minimal manual handling. More so, it is needed to meet stringent requirements which allow fabrication shops to boost their productivity, minimize errors, reduce waste, and prevent additional costs.

Modutek offers fully automated wafer fabrication equipment which provides fully automated control of the wafer fabrication process. It has integrated software such as Modutek's SolidWorks Flow Simulation and SolidWorks Simulation Professional which allow operators to calculate process variables and track chemical usage. Once the process is programmed, the advanced robotics will execute the process steps without intervention or monitoring from the human user. This results in a consistent process environment, increased throughput and increased output quality.

Both the software and the robotics have significantly improved process control, reliability and efficiency. Since a lot of semiconductor suppliers have their own requirements for different kinds of wafer manufacturing, Modutek designs the equipment, assembly and testing, and even the software, to match these specific customer requirements.

The last etch process involves etching the silicon wafer to remove the silicon oxide layer and then drying the cleaned wafer in a drying chamber. At this stage, any contamination can negatively affect later processes and will result to semiconductor components of inferior or defective quality. Modutek's newest product introduces the combination of the last etch (HF) and IPA drying chamber to prevent handling the silicon wafer and thus reduce its chances of contamination.

Read the complete article titled “Advancements in Wafer Fabrication Equipment Improve Semiconductor Manufacturing” to learn more about Modutek’s advancements. If you would like to discuss your particular needs, would like to schedule a free consultation, or have questions, call Modutek at 866-803-1533 or send an email to Modutek@modutek.com.

The Benefits of Using Modutek’s Quartz Tube Cleaning Solutions

Ultra-clean and reliable quartz tubes are a basic requirement to ensure a precise and smooth semiconductor wafer fabrication process. That’s why quartz tube cleaning stations are required equipment at every semiconductor wafer foundry.

The Quartz tube cleaning process requires the use of corrosive chemicals, and requires the involvement of a manufacturer and installer to design and install units specifically tuned and adjusted to meet the specific application.

Quartz tubes themselves are delicate components, they need to be handled meticulously as they can be prone to risk and damage. The ideal quartz tube cleaning process minimizes human handling at all stages. This is why automated tube cleaning stations are essential equipment for semiconductor manufacturers.  

Fortunately, there are quartz tube cleaning stations today that require minimal human handling at every stage, and Modutek’s quartz tube cleaning stations do exactly just that.

Built out of white polypropylene, Modutek’s quartz tube cleaning stations are designed to keep quartz tubes in motion while they are being etched, and powerful nozzles direct water spray at the quartz tube to maximize coverage.

Units can also be custom-designed and equipped with many other options (such as automation and hot nitrogen drying processes) that can be applied for more efficient cleaning procedures. From automated program recipes to tube roller systems, every part of the process can be made more efficient with automation. Operators using the automated station will simply monitor the process through the data shown on the screen, and can control various functions remotely.

Whether you need a manual or automated quartz tube cleaning station, Modutek designs it for you in house at their facility to ensure excellent and superior performance in any installation.

For more details read the posted article titled “The Benefits of Using Modutek’s Quartz Tube Cleaning Solutions”. If you want a quote or consultation on selecting equipment for your specific application call Modutek at 866-803-1533 or email Modutek@modutek.com.

Custom Fabrication Services for Unique Wafer Processing Requirements

Research labs and semiconductor manufacturing facilities often have special requirements for certain projects or prototypes that may need custom equipment to support their manufacturing procedures.

Semiconductor manufacturing facilities may need customized tanks, carriers or chemical stations to manufacture a particular product or may need to change existing equipment based on external changes or new requirements.

When new products are developed, single items are manufactured, or prototypes are done for testing, existing wafer processing equipment being used may not be suitable for the job. There are many factors: changing suppliers and/or environment and safety regulations imposing additional requirements or changing existing ones. In such cases, retrofitting the equipment, adding new components or changing parts or any other customization may be the best and most cost-effective solution to meet the current requirements.

On the other hand – other semiconductor manufacturers want to customize their existing equipment to let themselves adapt their production lines to current requirements, to speed up production and to increase throughput.

Fortunately, Modutek can provide expertise and experience to manufacturers when customized solutions are needed to support their unique wafer processing equipment requirements.

With over 35 years of experience supporting the needs of the semiconductor manufacturers and research facilities, Modutek specializes in custom design and development. They offer a wide range of customizations that include retrofitting equipment, upgrading stations, improving chemical delivery systems, etc., to meet client specifications, safety standards and environmental regulations. By using their expertise and experience to design and build customized equipment, Modutek’s engineers know exactly what works best and how existing equipment can be modified to meet any specialized requirements.

If you have questions, or would like a free estimate, after reading our full article “Custom Fabrication Services for Unique Wafer Processing Equipment,” please feel free to call Modutek at 866-803-1533 or send an email to Modutek@modutek.com.

Single Wafer Processing Spurs Demand for Wafer Cleaning Equipment

Wafer cleaning equipment suppliers regularly invest heavily in research and development in order to stay abreast of the ever-changing market trends. It also helps them meet the high demands of certain industries such as semiconductors, printed electronics, and single wafer processing.

More and more operators are jumping into the semiconductor equipment industry. Thus, the trend fuels the high demand for wafer cleaning equipment.

Single wafer processing is one of the factors that drive the global wafer cleaning equipment market's continuous growth. Single wafer processing uses ozonized wafer and hydrofluoric acid in a single spin technology to reduce cycle times and boost output flexibility.

Single wafer cleaning equipment becomes competitive but only when the cycle times for individual wafers are low and the quality of the output can be comparable to wet batch processing. It can be used to etch silicon and provide a wet process for mini-fab single wafer cleaning. This process is often done together with megasonic cleaning because it helps in removing the tiniest particles and impurities, resulting in low particle count for the finished substrate.

Some single wafer processes are attractive because their deliver better results than the use of traditional process. The use of megasonic cleaning in particular reduces particle counts for even the smallest particles. The cleaning method uses megasonic sound waves in the cleaning solution which generate cavitation bubbles. These bubbles can remove the very small particles from the substrate surface. This type of cleaning is better than the traditional methods as it uses no harsh chemicals and reduces particle counts.

As semiconductor equipment manufacturers embrace single-wafer processing, the demand for single wafer cleaning equipment will increase significantly.

For more information read the complete article “Single Wafer Processing Spurs Demand for Wafer Cleaning Equipment”. If you would like a free estimate or have questions, contact Modutek by email to Modutek@modutek.com or by calling 866-803-1533.

Advantages of HF-Last Etching and IPA Drying in One Chamber

After cleaning, a silicon wafer needs to be effectively cleaned and dried with no particle contamination. Clean wafers are important to avoid errors in the next processing steps to produce devices that are of superior quality and free from defects. Using the single chamber HF-last and IPA vapor dryer show a considerable reduction in wafer substrate particle counts.

By the final stage of silicon wafer cleaning, the silicon oxide layer has to be removed and the cleaned wafer dried free from contaminants. However, transferring the wafers from the HF etching process to a separate drying chamber will likely cause the wafers to pick up particles.

Modutek now has a solution to this problem: the single-chamber HF-last and IPA vapor dryer, which can help to significantly reduce the particle count on wafer substrates.

In the single chamber process, Modutek uses IPA vapor drying in a free-standing unit with one DI water rinsing and drying. This method, also called the Marangoni drying technique, results in clean wafer substrates -- having no contamination or watermarks.

Modutek has modified the IPA vapor dryer to include HF (hydrofluoric) acid injection before the start of the standard IPA vapor drying process. The HF acid injection ratio is controlled and provides an etch to bare silicon. When the silicon is etched, it is then rinsed to a controlled pH level. Once the appropriate pH levels are reached, it is then followed by the IPA drying process without moving the silicon wafers. This results in the low particle count on the wafer.

Initial field results from the single chamber HF-Last IPA dyer that Modutek has supplied to customers are showing outstanding results. Within the 0.3 to 5 micron range, fewer than 20 particles (adders) were added to etched substrates which are substantially below what was achieved in previous processes in this field trail.

For more details read the complete article “Advantages of HF-Last Etching and IPA Drying in One Chamber” to learn more about Modutek’s IPA vapor dryers. Call Modtuek at 866-803-1533 or send an email to Modutek@modutek.com if you have questions or would like to get a free consultation.

Improving Process Control with Fully Automated Wafer Fabrication Equipment

An increasing number of wafer fabrication applications require tight process control. Accurate chemical dosage and precise process timing become critical for a high-quality output.

Manual and semi-automated controls are susceptible to human error and a variation in how process steps are carried out. These processes can be improved with the use of fully-automated wet benches and chemical stations which help with consistent execution.

The combination of fully automated wafer fabrication process and software ensures better repeatability, minimized waste and improved production line performance.

Modutek designs and manufacturers their fully automated wafer fabrication equipment in-house to ensure the highest quality standards are met. In addition, Modutek has developed their own SolidWorks Simulation Professional and SolidWorks Flow Simulation software, which will provide a consistent automated process and ensure correct dosages. The software can also perform simulations and track chemical use.

Modutek offers standard wet bench chemical stations or customized equipment to meet the customers' exact standards and specific application. They can handle both solvent and acid applications, and the equipment can process sizes up to 30 inches by 60 inches.

There are a number of benefits in using fully automated wafer fabrication equipment. The process is set up and can be run repeatedly with minimal monitoring. It also allows for improved process control and accurate chemical dosage, precise timing of process steps, exact replication of the process sequence, and full neutralization of chemical waste. A fully automated process also reduces the use of chemicals. Process output remains consistent, the number of defective results is low, and production line and productivity are improved.

Read the entire article “Improving Process Control with Fully Automated Wafer Fabrication Equipment” and then call Modutek at 866-803-1533 to get a free consultation. You may also send an email to Modutek@modutek.com with any questions you may have.

Modutek Provides Solvent Delivery Pump Station for Large Pharmaceutical Company

Modutek can develop and produce complex and wide-ranging chemical delivery systems that meet challenging customer requirements. As a semiconductor manufacturing company with over 35 years of experience, Modutek delivered its most recent project: providing solvent delivery pump supply for a large pharmaceutical company.

In this project, Modutek supplied nine solvent pumping cabinets, each equipped with two pneumatically-operated pumps. These pumps have pulse dampers and are fitted with air-actuated ball valves on the inlet/outlet of each pump. The pilot valve will regulate the supply of clean, dry air (CDA). A series of valves and monitoring system controls ensures the transfer of solvents to distribution points close to the process.

Each custom-built cabinet has an ultrasonic leak detector housed in a one-inch pipe “T” at the lowest point of the cabinet. The cabinet also features a drain “On/Off” selector and a 4-20 ma pressure transmitter.

The Programmable Logic Controller (PLC) controls these pumps, which in turn will deliver up to four gallons per minute.

When the request for a pump is received, the drain valve “On” function shuts off while the pilot valve supplying CDA to the pump opens. The ball valves then open, allowing the solvent to flow from the pump inlet and past the pressure transmitter to the process.

When the drain valve is turned “On,” the pilot valve, the discharge ball valves, and the pump inlet are disabled. The drain valve opens and the solvent is discharged and transferred into a collection container. Once draining process is completed, the operator can shut off the drain valve, resuming the normal operation of the pumps.

In case the ultrasonic leak detector in the pipe “T” recognizes a leak, the pilot valve, and the corresponding ball valves close, stopping the transfer of the solvent.

Solvents handled include acetone, methanol, ethyl acetate, heptane, isopropyl acetate and methyl tert-butyl ether.

Modutek can help manufacturers with complex chemical delivery systems by developing customized equipment to meet specific requirements. All chemical handling and delivery system equipment designed by Modutek is designed and manufactured in-house at their facility in San Jose California.

If you have questions after reading the complete article “Modutek Provides Solvent Delivery Pump Station for Large Pharmaceutical Company”, contact Modutek for a free consultation at 866-803-1533.

Designing Semiconductor Manufacturing Equipment for Ergonomics and Safety

Safety is something that semiconductor equipment suppliers need to incorporate into all aspects of their equipment since the manufacturing process involves the routine use of chemical processing.

Safety guidelines, such as the SEMI S2, published by the global industry of microelectronics manufacturers, ensures suppliers implement safe operating protocols. Better ergonomic design of semiconductor manufacturing equipment as described in SEMI S8, helps promote a safer operating environment to reduce operator fatigue and strain.

Old installations may not meet the current safety standards or satisfy the owner's safety goals. It's better to purchase brand-new equipment that incorporates the use of upgraded safety features to ensure that the equipment and work environment will be as safe as possible.

Modutek follows the SEMI safety and ergonomics guidelines by designing equipment that's easy to use and reduces strain and fatigue. These include the wafer holding tray on Modutek wet benches which uses a robot arm whose function is to hold and move the tray to the front of the station for optimal loading with less effort. The wafer holding tray is just one of the examples of how Modutek implements ergonomic design to help operators do their work safely and with less effort. This results in fewer accidents, increased productivity and a better work environment.

Manufacturing facilities and research centers need to prioritize safety when purchasing semiconductor manufacturing equipment. While manufacturing facilities and research labs use clean rooms fitted with sprinkler systems, fire alarms and other kinds of fire protection, they can reduce the likelihood of fire accidents by minimizing the use of flammable equipment. Many wet bench processes use corrosive chemicals in tanks and pipes made of plastics or other synthetic materials that can be flammable. Modutek can support efforts of reducing the use of flammable materials by supplying equipment that complies with the FM 4910 flammability specifications to further reduce the likelihood of fire.

Find out more about how Modutek’s ergonomic designs can benefit your facility by reading the complete article “Designing Semiconductor Manufacturing Equipment for Ergonomics and Safety.” Call Modutek if you have questions or would like to discuss your specific semiconductor equipment requirements.

Upgrading Used Semiconductor Manufacturing Equipment and Wet Benches

As long as existing semiconductor manufacturing equipment or wet benches are not near the end of their useful life, it is often more practical to upgrade them than to buy new equipment.

When the equipment experiences a downtime, it may be a good time to replace key components while the entire subsystems can be upgraded during scheduled maintenance to prevent further downtime. Upgrading and retrofitting the used equipment with new components as well as repairing their defective parts can result in extended useful life for wet benches and related equipment. Upgrades can also help further increase throughput, improve safety, ergonomics, ease of operations, and chemical delivery system performance. If you want your equipment to be able to handle larger wafer sizes, upgrades are also the way to go.

Modutek has many years of experience and expertise in upgrading existing wet benches and other related equipment -- whether it's their own or from another manufacturer. Among the equipment upgrades Modutek can provide:

·         Identifying and replacing defective or obsolete parts with new or retrofitted components

·         Updating robotics, baths, and wet etching components

·         Upgrading motion controls and software

·         Redesigning and improving systems within an existing footprint

·         Re-conditioning existing systems to improve performance

Upgrading brings a lot of benefits, including the opportunity to upgrade semiconductor fabrication equipment from manual to semi-automatic or a fully automatic configuration to improve consistency and reduce operational errors. Modutek can determine whether such upgrades or retrofits are feasible by evaluating the performance of their older models (or units from some other manufacturers) and then performing the appropriate work.

For more information, please read the complete article titled “Upgrading Used Semiconductor Manufacturing Equipment and Wet Benches”. If you have additional questions or would like to discuss your specific needs, call 408-362-2000.

How to Select a Supplier from Your List of Semiconductor Equipment Manufacturers

Choosing a supplier from your list of semiconductor equipment manufacturers means you’ll have to look at key factors, such as:

·         Company experience and expertise - Selecting the right semiconductor manufacturing equipment supplier will affect future productivity and output quality. In this regard, it is imperative to go for a more experienced company with a wealth of expertise in this department.

·         Customization capabilities to meet customer requirements - Manufacturers differ from one another and have their own specifications regarding the installation or upgrade of the components. Sometimes the purchased equipment needs to interface with existing systems, and sometimes the physical setup of the production facilities is a limiting factor in what can be installed. Proposed equipment often has to be customized to some degree and the supplier needs to have the experience and capability to adapt their standard solutions to specific situations.

·         Equipment reliability – Ask your supplier for references and reliability statistics regarding the equipment you have purchased. Suppliers should provide details on hours of scheduled maintenance downtime, estimates of unexpected downtime as well as records of actual installations. It’s also a good idea to check with some references who are not direct competitors of your company to verify the information from the supplier.

·         Warranties, service and customer support - It is extremely important to ask for a written guarantee from your chosen supplier before you sign a contract with him. Thoroughly read the warranty and make sure that all the details (service personnel, customer support, etc.) are included. A manufacturer who hires his own personnel -- as opposed to subcontracting other employees -- is a good indication of a good supplier with a competent service staff/support.

Once you have found the ideal semiconductor equipment manufacturer/supplier, you will be able to look at cost of ownership and pricing to make your final decision. Read the complete article titled “How to Select a Supplier from Your List of Semiconductor Equipment Manufacturers” to learn how Modutek can help you. If you have questions after reading the article, please call 408-362-2000.

Tips on Selecting Wafer Processing Equipment for Your Application

The semiconductor manufacturing and research industries use wet benches to produce silicon wafers that need to undergo cleaning and etching.

The wet bench equipment needs to be flexible configured to meet certain manufacturing processes. Ideally, it should be designed for both acid and solvent cleaning applications.

Usual processes used for wafer processing equipment include KOH Etching, Buffer Oxide Etching (BOE), RCA Clean, plating and Megasonic cleaning. The equipment can also be tailored to meet the customer's specific process requirements. Customers can choose three different types of wet benches according to the budget framework and the process:

·         Fully automated stations – This offers excellent consistency of process steps and improved output quality. It is designed to precisely control the use and chemicals and process times. This leads to minimized wastes which in means in saving money as well as easier compliance with environmental regulations. Automated stations also help to reduce operator errors.

·         Semi-automated stations – This offers some features of the fully automated stations, at a much lower cost. It has servo-controlled robots which allow operators to precisely control chemical use and process times. It also has user-friendly controls.

·         Manual stations - This offers no robotics but has the same high quality process equipment as the fully and semi-automated stations.

All of Modutek’s wafer processing equipment stations are built with white propylene construction with wiring to NFPA 70 and 79, and have safety features. They can be ordered as standard units or can be customized to meet certain processing, etching or cleaning applications.

Our full article “Tips on Selecting Wafer Processing Equipment for Your Application” goes into more detail. If you have questions after reading this, please contact Modutek at Modutek@Modutek.com. 

How Piranha Etch is Used in Silicon Wafer Cleaning

The Piranha or SPM (sulfuric peroxide mix) solution consists of a mixture of sulfuric acid and hydrogen peroxide. When combined in correct ratios, this solution can clean organic contaminants and residues from wafers and oxidize most metals. The powerful chemical action that makes it a preferred method for stripping and cleaning of wafers also makes it hard to use.  Silicon wafer cleaning equipment is required to handle the corrosive chemicals needed to support the piranha etch process on semiconductor wafers safely and effectively.

When a facility wants to re-use the piranha solution, they spike it with hydrogen peroxide which allows the piranha solution to be usable for up to eight hours rather than replacing the solution every two hours. Spiking conserves the sulfuric acid as well as saves money, but at the same time it requires wet bench equipment that can support the spiking and the overall process of piranha etching.

Modutek's high-quality silicon wafer cleaning solutions are specifically designed to handle corrosive cleaning chemicals and can support the piranha etch process safely and effectively. Modutek can supply standard equipment or customized wet benches to fit to the customer's specifications. Piranha wafer cleaning is supported by Modutek's QFa quartz recirculating tanks and QA constant temperature baths. Both can be installed in a wet bench station and can be programmed and controlled manually, semi-automatically, and automatically.

For more information read the complete blog article titled “How Piranha Etch is Used in Silicon Wafer Cleaning” to learn more about Modutek’s silicon wafer cleaning equipment. You may also call or send an email to request a free quote or recommendations for choosing the right wafer cleaning equipment for your application.

Reducing Wafer Processing Time and Costs with a Wafer Etching System

Semiconductor fabrication and research facilities can reduce wafer processing time and cost using Modutek’s rotary wafer etching system. This automated batch processor is a compact and freestanding wet bench unit with a dual tank design. It has a carrier assembly line that takes the wafer boats into the chemical tank where it provides rotational agitation for a set time. Next, it transfers the carrier assembly to the rinse tank for rinse cycles.

Once the rinse cycle is done, the carrier can be placed in the unload position were the wafer boats can be removed for drying. The rotation of the wafers in the baths is consistent, and the transfer of the wafers from the chemical tank to the rinse tank is also made much faster.

Modutek’s wafer etching system also features a touch screen control along with programmable recipes that provide full automatic wafer processing. Its microprocessor can control up to five recipes that are programmed via the touch screen. The screen displays the use and process information.

Once the operator turns on the process, the system will take control of the carrier and transfer it via the chemical and rinse cycles according to programmed values. It can accommodate multiple wafer sizes in one toll with a rotor change and it has a production capacity of up to fifty 6-inch or twenty-five 8-inch wafers at a time. Additional system options also include the capacity to handle larger wafer sizes, a chemical filtering and re-circulating system, a gravity chemical fill system, a fume condenser, and a heating/cooling system in the process tank.

Modutek's Rotary Wafer Etching System helps in reducing wafer processing time and costs. It delivers the chemical etching, stripping, cleaning, and developing solutions for semiconductor wafers or substrates. It boasts high precision, improved safety for operators and fast processing in a compact design.

Call or email Modutek Corporation at modutek@modutek.com to discuss how a wafer etching system can save your company time and money. You can also learn more by reading our entire article “Reducing Wafer Processing Time and Costs with a Wafer Etching System.”

Selecting the Right Equipment for Your Silicon Wet Etching Application

Fabrication facilities need use a semiconductor equipment supplier who can provide a wide range of dependable products to support their applications as well as meet their specific requirements.

Modutek has over 35 years of experience and expertise providing high-quality and reliable products for all silicon wet etching applications. The list below is some of the products Modutek offers to support wet etching applications.

1. Quartz Baths
Modutek's quartz baths support a wide range of etching, cleaning and stripping applications (which include the SC1 cleaning, RCA clean and SPM clean).

2. Sub-ambient Systems
Modutek's sub-ambient filtered etch baths are specially developed for BOE (buffered oxide etch) and positive resist develop applications. Various options are provided that allow customers to match the system to their requirements.

3. Temperature Controlled Circulators
The Modutek RCe Series of Temperature Controlled Recirculators are ideal for etching, plating and developing applications and constant temperature baths.  

4. Teflon Tanks
Modutek's Teflon tanks have a modular design which can be easily integrated into both new and existing silicon wet etching stations. Available configurations include temperature controlled recirculating baths, temperature controlled static baths as well as Teflon ambient baths.

5. Nitride Etch Baths
These baths are designed and developed for exceptional process control and operation safety. Modutek designs a two-tier control system that controls the temperature while keeping the acid-to-water ratio levels by adding DI water as required.

6. Quick Dump Rinsers
Modutek's Quick Dump Rinsers provide efficient and thorough rinsing without particle entrapment with less use of DI water. They include DI water spray nozzles and N2 agitation along with consistent rinsing with bottom filling.

7. Solvent Baths
These baths are made of stainless steel tanks and are ideal for all solvent applications (which include IPA, acetone and resist strippers).

Read our complete article entitled “Selecting the Right Equipment for Your Wet Etching Application” to learn more about equipment support for your application. Contact Modutek for a free quote and recommendation on selecting for your silicon wet etching application.

Silicon Wafer Etching Processes for Wet Processing Applications

Manufacturing semiconductor components like processors and integrated circuits relies on silicon wafer etching of various processes including KOH etching to generate the required structures and connections.

Modutek's wet benches and other equipment can be used for a wide range of wet processing applications, which include:

KOH Etching – This involves the use of potassium hydroxide (KOH) in etching silicon wafers. This process is used to create microscopic structures in the silicon. It is important to note that KOH etching is a repeatable process that is inexpensive and etches quickly. Modutek's PFA Teflon tanks of their TFa or TT series are suitable for this etching application.

Silicon Nitride Etch – This is deposited on the silicon wafer in a thin film form and is etched with a hot phosphoric acid. It is used as a masking material in the fabrication of integrated circuits. Modutek's silicon nitride etch baths are suitable and safe for supporting this etching process.

Piranha Etch – This is used to clean silicon wafers during the semiconductor manufacturing process. The cleaning agent in this application consists of a mixture of sulfuric acid and hydrogen peroxide. Modutek can evaluate the customer's specific cleaning requirements and propose suitable solutions from its vast product line of wet processing equipment.

Metal Etch - Etching metals such as aluminum, gold and copper can be challenging process. Effective etching depends on selecting the right chemicals to use with the process. Modutek's vacuum metal etcher was developed and designed for precise wet etching of aluminum layers.

Gallium Arsenide (GaAs) Etch – Modutek's wet process solutions can handle the etching of Gallium Arsenide, which is used in the manufacture of integrated circuits and other electric and electronic devices. The solutions used consist of hydrogen peroxide, usually combined with sulfuric, hydrochloric, and phosphoric acids.

Modutek’s Wet Bench Solutions deliver reliable, repeatable results that are safe and accurate. For a free quote or assistance in selecting the right equipment for your silicon wafer etching process, contact Call Modutek at 866-803-1533 or send an email to Modutek@modutek.com. You can learn more about Modutek’s silicon wafer etching processes by reading “Silicon Wafer Etching Processes for Wet Processing Applications.”