Why Particle Removal is Essential in Silicon Wafer Cleaning

The effective removal of particles and contaminants is vital part of silicon wafer cleaning. Particles and such other impurities that are either deposited on wafer surfaces or are left over from the previous process stages, can cause defects in the final semiconductor product. Even the tiniest particles can block etching and have a negative effect in the diffusion process, resulting in semiconductor circuit that is either defective or having reduced quality and life expectancy.

The goal of all silicon wafer cleaning processes is to leave the silicon wafer surface intact along with removing contaminating particles at the same time. Specialized equipment is required for various cleaning processes which include traditional standard processes that can be used together with new technologies aimed at removing even the smallest particles.

The different cleaning methods which are used at different stages of the silicon wafer fabrication process include the following:

• RCA clean process – consists of two steps: SC1 (which removes organic particles) and SC2 (which removes metallic residues and particles). Each of the steps uses different cleaning chemicals to remove residues or particles.
• Piranha cleaning process – removes large amounts of organic residues such as photoresist. It uses a corrosive mixture of sulfuric acid and hydrogen peroxide, which must be handled with care.
• Megasonic cleaning – removes particles and other contaminants using microscopic cavitation bubbles generated by a megasonic cleaning system.
• The Ozone cleaning process–uses ozone to convert organic particles and contaminants to carbon dioxide. 

Pre-diffusion clean is one of the most critical silicon wafer cleaning processes that takes place just before the wafers are placed in the diffusion oven. Any of the cleaning methods listed above or a combination of these can be used to ensure that wafers are free of particles so diffusion will be even and consistent.

The great news is that Modutek, a company with over 30 years of experience in providing semiconductor manufacturing solutions, offers wet bench technology which supports all of the above-mentioned cleaning methods. Their silicon wafer cleaning systems can come in manual, semi-automatic or fully automatic. They are available in standard configurations but Modutek can also design custom products to meet the client's cleaning specifications.

Silicon wafer cleaning is important for achieving quality wafers. Read the complete article “Why Particle Removal Is Essential in Silicon Wafer Cleaning” for more information. If you have questions or would like to a get a free consultation or quote, call 866-803-1533 or email Modutek@modutek.com.

How the Advanced Ozone Cleaning Process Improves Wafer Yields and Reduces Costs

Modutek's advanced ozone cleaning process is a better alternative to the traditional wafer cleaning methods and reduces chemical use.

The ozone cleaning process involves the use of ozone which converts organic residue on wafers into carbon dioxide through oxidation. This process effectively cleans wafers so they are free of contaminants. Modutek's advanced ozone cleaning process leads to improved silicon wafer cleaning and reduced use of harmful cleaning chemicals.

How does the ozone cleaning process work?

Modutek DryZone gradient dryer uses DI water to rinse away organic impurities from the wafer before the wafer is exposed to ozone. The Coldstrip ozone cleaning method cleans at sub ambient temperatures while the Organostrip cleans at room temperature.

The ozone has a powerful oxidizing action which converts carbon impurities of organic residue to carbon dioxide. This results into wafers that are clean and free of particles.

Modutek's advanced ozone cleaning process can be used with plain water or just a mild solvent. It doesn't rely on harsh cleaning solvents, unlike other traditional cleaning methods. The wastes resulting from the advanced ozone cleaning process are harmless to the environment, while it maintains its superior cleaning performance.

It is also cost-effective: the equipment, processing, shipping, handling and disposal costs are greatly reduced compared to those in other cleaning processes such as Piranha (which, for instance, requires several cleaning tanks, some of which use cleaning solvents). Modutek's advanced ozone cleaning process doesn't require adherence to strict regulations since it uses very eco-friendly methods.

If you have questions, you may contact Modutek by email Modutek@modutek.com to learn more or read the complete article titled “How the Advanced Ozone Cleaning Process Improves Wafer Yields and Reduces Costs.”

How the Ozone Cleaning Process Improves Silicon Manufacturing Yields

Compared to the traditional cleaning process, the ozone cleaning process (using water or a mild acid) can clean or strip wafers faster and more cost-effectively. Modutek Corporation has developed its own Advanced Ozone Cleaning Process which doesn't necessitate the use of expensive cleaning solutions and eliminates waste while improving the cleaning process.

The ozone cleaning process works by providing cleaner silicon wafers with decreased particle amounts. For example, in Modutek's DryZone gradient dryer, the process cleanses substrates with DI water to eliminate inorganic impurities before exposing them to ozone in an ozone chamber. The result is a cleaner substrate surface -- free from impurities and moisture and become stable hydrophilic surfaces.

The wafers in Modutek's Organostrip process are exposed to an organic solvent incorporated with ozone at room temperature. This technology yields very high ozone solubility in the liquid. It results in faster resist removal. All types of tested metals (including aluminum, copper, gold, tantalum and titanium) are compatible in this process.

The ozone cleaning process has many advantages over the Piranha process. These advantages include more rapid processing, better compatibility with metals, fewer particles on the surfaces, improved safety, and lower operating costs.

Discover more about the Ozone Cleaning Process by reading the recent article titled “How the Ozone Cleaning Process Improves Silicon Manufacturing Yields” on Modutek’s website. For a free consultation or quote on using Modutek’s ozone cleaning process to improve your manufacturing yields, call 866-803-1533 or email modutek@modutek.com.

Modutek at Semicon Conference in China

Modutek Corporation, provider of leading-edge wet benches and wet process equipment, will have a factory representative at the Semicon Conference in Shanghai, China on March 15 to 17, 2016. Modutek will join their China Rep Laserwort in Hall N3 at booth 3401. Those who are interested in Modutek's wet benches and wet process equipment can stop by the booth to learn more about the company's Automated, Semi-Automated and Manual Wet Bench Process Stations, which feature several applications and benefits like KOH etching, quartz cleaning, ozone etching and more.

Modutek also provides IPA vapor drying and Megasonic cleaning equipment for your manufacturing applications. Aside from that, eco-friendly acid neutralization systems and air scrubbers are also all available with all their equipment.

For more information about the Semicon Conference in China, refer to this website at www.semiconchina.org. You can also read more at “Modutek at Semicon Conference in China.”

Ways the Ozone Cleaning Process Supports Green Technology

The chemical solvents that most companies use during semiconductor manufacturing require special handling and are not environmentally friendly. Due to increasing concerns regarding environmental issues and disposing of chemical solvents, Modutek supports an alternative method called Ozone cleaning (stripping) process.

Rather than using chemical solvents which serve their purpose and are not environmentally friendly, Modutek’s Ozone cleaning process reduces or eliminates the use of chemical solvents in the process. This makes it much more cost-effective in a manufacturing facility. The equipment used in this process eliminates the need for solvents such as base strippers or sulfuric acid. These chemicals are not only costly to buy and dispose of, but also pose added risk to employees and to the environment.

Modutek's Ozone cleaning process is cleaner than using chemical solvents, safe to use, and environmentally-friendly. For more details read the article titled How the Ozone cleaning Process Supports Green Technology. If you have questions, you may call us at 866-803-1533 or email us at sales@modutek.com.

Ways Modutek's Wafer Fabrication Equipment Produces Best Results

Modutek has been manufacturing a line of wet processing equipment and wafer fabrication equipment for businesses in the semi-conductor industry since the company was established in 1980. Modutek has served and worked with many clients, including the industry leaders. Throughout its existence, Modutek has maintained its focus and is committed to providing the highest-quality equipment for clean rooms for advanced industrial and technical applications. Modutek's wet bench stations and wafer fabrication equipment have been widely used in an array of applications from academic to commercial.

How to get the optimum results using the Modutek Wet Processing Stations

The use of Modutek's line of high-quality wet-processing and wafer fabrication equipment will insure you achieve optimum results. Modutek's high-quality wet processing stations are designed and tailored to meet your specific manufacturing requirements. The benches come in an array of types:  manual, semi-automatic, and fully-automatic. These provide bring unique set of options at different price points according to your requirements.

Wet Bench Manual Stations
Modutek's wet bench manual stations support both solvent and acid applications. It presents a wide variety of functions and options including safety features that do not require advanced robotics. These manual stations provide a lower cost option.

Wet Bench Semi-Automatic Stations
These competitively-priced stations offer a host of different customizations. Modutek's semi-automatic stations support systematic steps for your manufacturing process. Whether you intend to use it for research in academic, or business applications, Modutek's semi-automatic wet bench stations provide support for these applications.

Wet Bench Fully-Automatic Stations
The most advanced of all stations is the Modutek fully-automatic station. It has in-house software, automatic robotics and high-grade, features that are state-of-the-art. Ideal for premium etch rates that require full automated process.

Built to your specific needs

Modutek's wet benches are customizable and can handle a number of applications and solvents, depending on the customer's needs and specifications. Aside from support of solvent applications, Modutek's wet benches are also able to handle other types of processes such as:

• KOH Etching
• Ozone Cleaning
• Ozone Etching
• SC1 and SC2 which features Megasonic Cleaning
• Precision Part Cleaning
• BOE Buffered Oxide Etching
• Quartz cleaning
• SPM Cleaning
• Plating
• Hot phosphoric (also known as Nitride Etching)

Modutek's wet benches: highly-customized with top-of-the-line features

The wet benches manufactured by Modutek are widely utilized in laboratories for medical, academic and solar cell manufacturers throughout the world. They are designed to produce consistent uniform results. They meet all standard safety requirements that are required in a manufacturing facility. Depending on the clients' needs, extra features can be added to meet additional requirements. These features are:

• FM4910 (PVC-C) material of construction
• Third party certification for NFPA 70 & 70
• Rear access design
• Semi standard, CE mark and NEC certifications are available
• Fan Filter Units (HEPA)
• Structural certification for Seismic zone 4
• Lift stations can be designed into the bench
• Counter balance safety shields
• Overhead deck lighting
• Dedicated drains to carboy with DOT containment
• Light tower (3-color)

When you need a unit that meets your specific requirements or applications, look to Modutek's experienced and seasoned engineers and technicians. They are able to customize the design, build and test your unit specifically to meet all your requirements. Modutek's Wet Benches and Wet Processing Equipment will provide the optimal results you need with their accurate and highly-reliable outcome for precision processes. You can also rely on Modutek's highly-commended, world-class service, customer support and set-up. Contact Modutek by calling us at 866-803-1533. You may also visit the Modutek's "Contact Us" page and complete the contact form.

Modutek Makes Ordering Easy for Chemical Fume Hoods

Chemical Fume Hoods are ventilation equipment that prevents extensive exposure to hazardous or toxic chemical fumes. They also limit the exposure of harmful dust, gas or vapors. Semiconductor manufacturing solutions firms, such as Modutek Corporation, manufacture fume hoods that come in a wide range of designs and features.

Fume hoods may be in the form of a table top exhaust hood or a freestanding hood that is equipped with a HEPA (High-efficiency particular air) filter. But there's no limit to design choices because Modutek designs and manufactures custom-made fume hoods, depending on the clients' particular needs, lab equipment requirements and specifications. These fume hoods are also ideal for wet processing.

Modutek manufactures and designs excellent fume hoods. The materials used are uncompromisingly of high-grade quality: stainless steel which can handle any solvent application you may have and white polypropylene which is suitable to withstand base and acid processes.

Modutek's fume hoods come with an electrical outlet at the deck level. Usually fume hood units can be manufactured using a standard outlet, a ground-fault circuit interrupter (GFI), or an electrical outlet that is explosion proof. Most states will require the use of GFI outlets because they offer the best protection from electric shock. Chemical Fume Hoods can also be fitted with the outlets needed depending on the clients' specific manufacturing requirements.

Fume hoods can also be manufactured with a built-in utility sink and a faucet (we offer a gooseneck faucet as an option), overhead fan filter units (FFU), carboy chemical containment system (that traps waste solvents during wet processing), counterbalanced safety shields, LED lighting (that is also fitted on-deck), DI hand spray, lift stations equipped into the benches, and many more. As Modutek offers customizing products, fume hoods can be designed according to its clients' current product specifications and requirements. The size and length of a chemical fume can be modified to meet the company’s processing needs. The company's fume hoods and exhaust stations are also designed to control the temperature of chemical baths.

If your company needs chemical fume hoods with specific requirements such as dedicated drains or carboys with DOT containment, call us at 866-803-1533. If your requirements include lift stations that are designed into the benches, HEPA fan filters, or D.I. water hand spray, Modutek would like the opportunity to build the chemical fume hood your company needs.