Friday, August 21, 2015

How the IPA Vapor Dryer Improves Wafer Processing Time

The IPA Vapor Dryer from Modutek meets the demands of facilities and process engineers who are continually looking for ways to improve silicon wafer processing time. This system includes the SolidWorks Flow Simulation and Simulation Professional software to ensure improved operations and drying time with one or two 150-450mm cassettes or glass substrates.

Modutek’s IPA Vapor Dryer design has both rinsing and drying capabilities. This Marangoni drying system incorporates a single chamber to facilitate the final stages of the cleaning process. The system provides high throughput along with other advantages including:

·         elimination of watermarks on substrates and hydrophilic/hydrophobic films with no feature damage
·         15-minute batch drying for most applications
·         secure system interface bottle change that allows for fast, deck-level applications


The IPA Vapor Dryer also has a variety of additional safety features and optional features to provide optimal wafer processing with wet processing equipment. If you have questions, call 866-803-1533 or send an email to sales@modutek.com for answers.

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