How the KOH Etching Process is Improved Using Modutek's Teflon Tanks

Among the various approaches that foundries use to manufacture semiconductors chips, the use of the KOH (potassium hydroxide) etching process is frequently preferred due to the error-free mass production capability it provides. Etching with potassium chloride (KOH) provides more precision and results to better quality control compared to dry semiconductor etching processes that present challenges in process control.

The fluids employed in the KOH etching process are stored in Teflon tanks built within the equipment – these tanks can make KOH etching more cost-effective, more practical and safer than other alternatives available. It’s also possible to structure the KOH etching process in a manner that will create an easily repeatable manufacturing process. When projects come in from different clients, fabrication plants can focus on setting up the equipment and process lines and worry less about safety and reliability issues.

One of the most significant improvements that Modutek brings to the KOH etching process is customized control. Modutek’s tanks have highly customizable temperature settings – temperature control can be achieved either through in-line heating and cooling equipment installed, or through immersion in liquid tanks. Temperature can be adjusted between 30°C to 100°C and changes can be adjusted at a rate of 2°C per minute on average depending on tank size.

Modutek designs Teflon tanks according to the specifications of each client’s installation. Whether a manufacturing facility needs recirculating baths for KOH etching processes or temperature controlled static baths, Modutek's Teflon tanks provide optimum control to reduce water loss and concentration deficiency.

For more details read the complete article titled How the KOH Etching Process is Improved Using Modutek’s Teflon Tanks. Call Modutek at 866-803-1533 if you have questions or would like a quote or email to Modutek@modutek.com.