Using Advanced Ozone Cleaning Processing for Photoresist Strip, Etch and Clean

Companies may be spending more money than they would like for chemical disposal and chemicals. If this is the case, turn to the money-saving Advanced Ozone Cleaning Process equipment manufactured by Modutek. Our team of experienced designers will collaborate with you to create and manufacture the perfect ozone cleaning process for each company’s application.

Discover the many advantages of using Modutek’s ozone cleaning process. It has been awarded a Green Technology certificate. With it, the system can greatly reduce your process chemical dependency. The Modutek ozone cleaning process cleans, strips or etches wafers, solar devices and substrates for far less than conventional technology, often for half the normal cost.

Our technology is patented which permits the use of either Ozone or Ozone/water and mild acid to process components. This patented technology achieves the same results as expensive chemicals but in an environmentally friendly way.

See how our ozone cleaning process compares with the standard Piranha process and notice the advantages:

• The Modutek Ozone/water cleaning process is safer because it can operate at room temperature with the same or better results. The Piranha (which uses hydrogen peroxide and sulfuric acid) reaches temperatures to 130C.
• The Modutek system is quicker than the Piranha. It processes 100 Wafer Batches at 6 Batches per hour in each Process Tank (@1.2-1.5um)
• This Ozone cleaning process is well-matched with a number of Metal Films. The Piranha, however, is NOT suitable for the same Metal Films.
• The Ozone cleaning process leaves no particle or metal residue on Wafers; Piranha DOES leave them.
• Modutek’s system is less costly to run and has an EPA Approved (Green Chemistry) certificate. The Piranha, on the other hand, is More Expensive to operate and IS NOT EPA Endorsed.
• The Modutek Ozone cleaning solution has a lifetime of > 1 week with continuous operation. The solution used in the Piranha has a lifetime varying between 8 and 24 hours depending on the concentration of the Peroxide and Temperature it used in processing.

Break-Thru O₃ Technology

• Proven to work with Gold, Copper and Aluminum as well as Titanium, Tantalum, Tungsten and many others
• Distributes Exact Chemistry to the Point of Use
• Replaces 2 to 3 Traditional Wet Benches processes

Other Ozone processes replaced:

• Metal etch
• Resist removal
• Surface preparation
• Surface etch
• Final clean

Call our office, 866-803-1533, to set up an appointment to discuss your ozone cleaning process needs. We will process a sample of your product to allow you to discover what equipment we have to offer. It is our desire to help meet your ozone cleaning process needs and we look forward to the opportunity to speak with you toward that end.