Semiconductor
equipment manufacturers provide equipment
that supports complex manufacturing process steps that must be followed and
controlled in a very precise manner. The process requirements will typically
include cleaning, etching, developing, and stripping along with the proper
handling/disposal of caustic chemicals. The physical attributes required in the
production line as well as special features (like recirculation and heating)
may also have to be considered.
The three main physical factors that
influence wet bench equipment
specifications include available facility space, wafer size, and wafer
throughput. Limited space for new installations or a requirement to integrate with
an existing system may require that compact stations be used. Some functions,
like rinsing and drying, can be integrated or may need separate spaces.
Chemical delivery systems can take space or be placed some distance away or
behind the production line.
Throughput is a crucial variable because this affects profitability. Automatic transfer of wafers between stations and automatic process control may save time. How the process is controlled may affect how long a chemical bath can take place without changing the chemicals and the need for downtime for maintenance.
Wet bench equipment and processes (such as RCA clean and Piranha) use aggressive and often dangerous chemicals. Therefore, the equipment should have a strong resistance to such corrosive substances as well as additional features to keep the operators safe.
Throughput is a crucial variable because this affects profitability. Automatic transfer of wafers between stations and automatic process control may save time. How the process is controlled may affect how long a chemical bath can take place without changing the chemicals and the need for downtime for maintenance.
Wet bench equipment and processes (such as RCA clean and Piranha) use aggressive and often dangerous chemicals. Therefore, the equipment should have a strong resistance to such corrosive substances as well as additional features to keep the operators safe.
These attributes can mean that almost every
installation of wet bench equipment is customized to some extent. However,
only an experienced semiconductor equipment manufacturer can offer a complete
line of wet bench stations incorporating the latest technology and using their
own software. A manufacturer should also offer other special features such as
heating control accuracy and precise calculation of dosages which are essential
for high-quality output. Suppliers who manufacture, assemble and develop their
own equipment should also be available for complete after-sales support and
service.
For more information read the article “Ordering
a Wet Bench Station for Your Specific Process Requirements”.
If you want a free consultation or have questions, contact Modutek at Modutek@modutek.com
or call 866-803-1533.
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