Wednesday, May 29, 2019

Ordering a Wet Bench Station for Your Specific Process Requirements


Semiconductor equipment manufacturers provide equipment that supports complex manufacturing process steps that must be followed and controlled in a very precise manner. The process requirements will typically include cleaning, etching, developing, and stripping along with the proper handling/disposal of caustic chemicals. The physical attributes required in the production line as well as special features (like recirculation and heating) may also have to be considered.
The three main physical factors that influence wet bench equipment specifications include available facility space, wafer size, and wafer throughput. Limited space for new installations or a requirement to integrate with an existing system may require that compact stations be used. Some functions, like rinsing and drying, can be integrated or may need separate spaces. Chemical delivery systems can take space or be placed some distance away or behind the production line.

Throughput is a crucial variable because this affects profitability. Automatic transfer of wafers between stations and automatic process control may save time. How the process is controlled may affect how long a chemical bath can take place without changing the chemicals and the need for downtime for maintenance.

Wet bench equipment and processes (such as RCA clean and Piranha) use aggressive and often dangerous chemicals. Therefore, the equipment should have a strong resistance to such corrosive substances as well as additional features to keep the operators safe.

These attributes can mean that almost every installation of wet bench equipment is customized to some extent. However, only an experienced semiconductor equipment manufacturer can offer a complete line of wet bench stations incorporating the latest technology and using their own software. A manufacturer should also offer other special features such as heating control accuracy and precise calculation of dosages which are essential for high-quality output. Suppliers who manufacture, assemble and develop their own equipment should also be available for complete after-sales support and service.

For more information read the article “Ordering a Wet Bench Station for Your Specific Process Requirements”. If you want a free consultation or have questions, contact Modutek at Modutek@modutek.com or call 866-803-1533.

Wednesday, May 15, 2019

Selecting Silicon Wet Etching Equipment for Your Application


The use of high quality Silicon wet etching equipment is needed in the manufacture semiconductor components. Selecting the right equipment is essential for maintaining facility performance and excellent product quality. The products produced at manufacturing facilities range from relatively simple electronic parts to complex components with intricate microstructures. With these kinds of varying requirements, most systems must be customized for the specific application.

Selecting silicon wet etching equipment along with any appropriate accessories may require professional and expert help since system parts must be closely integrated and seamlessly move silicon wafers through multiple fabrication steps. Precise chemical dosages, as well as accurate temperature control and exact timing, are important for consistent results.

Tanks and baths
Each of them is specifically made to support certain chemical processes and should be made from high-quality materials to reduce contamination.

Quartz baths — for cleaning processes such as RCA and SPM.
Teflon tanks — for etching applications such as KOH and TMAH.
Stainless steel tanks — for solvent baths.

Automation
Wet benches can be operated manually, semi-automatically, or with full automation.

A manually controlled wet bench allows human operators to set process parameters and calculate chemical doses before beginning and monitoring the process.

A semi-automated wet bench features some process steps that are automated but it still requires the control from the operator.

A fully automated wet bench runs the entire process and improves the performance of silicon wet etching equipment in many ways, which include: reduced human error; reduced chemical use; increased etching accuracy; and improved etch rates.
Modutek provides excellent silicon wet etching equipment and you can learn more by reading the complete article “Selecting Silicon Wet Etching Equipment for Your Application.” You may request a free consultation or more information by contacting Modutek at 866–803–1533 or email Modutek@modutek.com.