
Only Teflon tanks are used in this process because Teflon is stable and doesn't deteriorate or corrode from using KOH etching.
The KOH etching process controls allow precise and repeatable temperature controls for positive fabrication results and high-quality production. KOH etching in Teflon tanks, along with temperature control, is an exceptional process for silicon wafer nanostructure fabrication in both manufacturing facilities and research environments.
KOH or potassium hydroxide etches silicon quickly and at a stable rate which relies on the concentration of the solution and the temperature of the liquid. Aside from that, this etching process is also influenced by the crystal planes of the silicon and the doping concentration. These factors can be applied for direct etching in certain directions and stop etching at defined points. The result is that KOH etching can produce the accurate nanostructures required if the crystal planes and the doping are used accurately.
Modutek, a company with over 30 years of experience providing semiconductor equipment solutions, offers Teflon tanks that are specifically designed to support the KOH etching process, which ensures high-quality wafer fabrication.
Teflon tanks are used because aside from its stability, they have the ability to eliminate contamination from the tanks or fluid paths by making sure that the KOH solution only comes in contact with Teflon. Teflon is not affected by the corrosive chemical. In addition Modutek’s Teflon tanks are welded using advanced PFA sheet welding techniques, which guarantees reduction of contaminants.
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