Wet Processing Equipment Applications

Modutek provides technologically advanced yet cost-effective wet processing equipment and solutions that produce high-quality output. Applications include wafer etching, cleaning, drying, metal etching and stripping. Particular solutions include KOH etch and nitride etch.

The rotary wafer etching system has the ability to etch, clean, reclaim, develop, and strip semiconductor wafers and substrates. It features a dual tank design with a transfer between tanks for etching and then cleansing or rinsing.

Modutek’s vacuum metal etcher can etch aluminum layers on semiconductor wafers with high precision. It is fully automated, and etches aluminum in a vacuum to remove hydrogen bubbles that impede the etching process and generate "snow" and bridging of the etched wafers.

Modutek’s IPA Vapor Dryer cleans dry wafers without creating water spots. It can utilize ozone in the drying chamber to remove organic contaminants. Most drying cycles can be done in 10 to 15 minutes.

Modutek's state-of-the-art wet processing equipment is designed to meet the applications of any semiconductor manufacturing or research facility with either standard products or custom-designed solutions. If you need help with selecting the right equipment for your application, contact Modutek at 866-803-1533.