The potassium hydroxide (KOH) etching is an effective
chemical process allowing for precise impressions within a silicon body. The
process uses a solution of DI water along with heavy alkalinity (pH levels
greater than 12). The solution's temperature is then adjusted to an ideal
thermal degree required for etching. Unlike other forms of etching, this
process allows for greater precision in terms of manufacturing silicon wafers.
Unlike dry
etching, the KOH etching process reduces the risk of exposure to toxic (and
even explosive) chemicals, creating a safe environment for manufacturing.
Modutek's Teflon Tanks are designed to
facilitate the maximum potential of KOH etching. Each unit is manufactured to
cater to the specific needs of clients. It can be used with wet bench equipment
to greatly reduce the impurities other etching process may establish, providing
more reliable, consistent results. For more details read the blog article
titled “Using the KOH Etching Process with Modutek's Teflon Tanks.”
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