How SC1 Clean is Supported in a Wet Bench Process

Before the high-temperature processing of silicon wafers, they first undergo Simple Clean 1 (SC1 Clean) processing, which is the first step of the RCA Clean. The SC1 Clean is a solution that removes organic impurities that attached to silicon and is typically made up of 5 parts deionized water, 1 part H2O2 and 1 part NH4OH.  

The procedure begins by mixing the deionized water and NH₄OH at about 75°C. Then H₂O₂ is added and the mixture is allowed to bubble vigorously before using. The silicon wafer is then rinsed in a new batch of deionized water to clean off the solution.

Modutek's cutting-edge precision megasonic cleaning system is able to meet your demands for the high-precision cleaning technology. The system includes:

·         Automatic frequency tracking system

·         High efficiency generator

·         Upper and lower limit controls

·         Available frequencies: 950kHz, 2MHz, 750kHz, 430kHz and 200kHz

With the help and expertise of Modutek's engineers, your equipment will be designed according to your specific requirements. Learn more by reading our article “How Standard Clean Particle Removal (SC1) Is Supported In a Wet Bench Process.” You may contact Modutek at 866-803-1533 for a free quote.