Wednesday, April 29, 2015

How Silicon Nitride Etch Processing Is Supported by Modutek



The silicon nitride etch process is used to selectively remove silicon nitride in relation to silicon oxide using wet or dry etching. This process is common in the manufacture of integrated circuits.

The silicon nitride etch process is quite intricate. The quality of etching equipment from semiconductor equipment manufacturers plays a large role in allowing engineers and process specialists to develop greater expertise and achieve better yield results. The silicon nitride etch process is facilitated by Modutek's Nb Series Operation Process. When this process is used with Modutek’s silicon nitride etch bath, it regulates the temperature while maintaining acid to water ratio via D.I. water supplementation.

Modutek's Nb Series is easy to install and can be implemented in new or existing stations, thanks to its new remote metering system. Process engineers trust Modutek's high-quality products and services, as the company puts emphasis on using the latest technology, meeting the customer's specific needs, and offering excellent technical support. For more information read our blog article titled “How the Silicon Etch Process Is Supported by Modutek” or contact Modutek at 866-803-1533 or 408-362-2000.

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