When steps for wet bench processing are done, the remaining chemicals and waste water must be drained and transferred to an area for neutralization and disposal. Depending on the physical layout of a manufacturing facility, gravity draining may not be possible or insufficient due to flow or speed. Chemical lift station pumps are required in these situations which transfers the chemical solvent in a controlled and optimized method. The use of chemical lift station pumps will enable the fast and complete removal of chemical solvents and waste liquids, leaving the wet benches ready for the new process step.
While designing new installations without lift station pumps and dependence only on gravity drains may be possible, these require facility changes that include upgrades or expansions and retrofitting of pumps. In these cases, chemical lift station pumps must be included in separate stations that are often located at the back of the wet stations. Since these separate stations take up valuable floor space dedicated to productions processes incorporating lift station pumps into new wet bench stations is a better alternative.
Modutek can incorporate lift station pumps into their existing wet bench stations and use them to pump acids, solvents and similar chemicals and solutions in their semiconductor manufacturing equipment. The lift station controls automatically monitor the lift station tanks. The installed level sensors detect the fluids in the in the tank. When the fluids are detected, the corresponding pump is activated to transfer the liquid from the processing station to the facility's neutralization area. Incorporating the lift pumps in the processing stations is an efficient and compact solution for new installations.
The complete article “Why Chemical Lift Station Pumps Are Needed for Wet Bench Stations” explains more details on the use of this equipment. If you have questions or would like a free consultation please call Modutek at 866-803-1533 or email Modutek@modutek.com.
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