Modutek DR Series Quick Dump Rinsers for Wafer Manufacturing

The deionized (DI) water rinse cycle is one of the most critical steps in all of wafer manufacturing. DI water is likely to be the primary substance to which your product is exposed, usually more than any other fluid in the entire process. A properly effective rinsing system is a dramatic contributor to reducing particles and defect densities. We have put much time into making it affordable and simple for you to transition into our quick dump rinser (DR series). You can upgrade or install a new wet process station, and we have a plan that will work for you.

There are two major features designed into our DR series Quick Dump Rinser. These are easy installation, whether you are installing into used or new equipment, and low consumption of DI water, thanks to rinse features.

Modutek equipment offers consistent, superior rinsing. Four factors that contribute to this are DI nozzles that are strategically located to spray efficiently, bottom filling, N2 agitation, and an optional bottom fill that results in vortex agitation within the rinse tank.

The DR Series Quick Dump Rinser’s interior volume has been reduced to a size that is the minimum possible to use with the wafer cassette. This reduced volume and 360º overflow weir, along with the quick dump, remove all contaminants of all sizes quickly from the wafer’s surface and anywhere around it, resulting in no recontamination.

Modutek also offers the C15sa Rinser Controller to be used with the DR Series Quick Dump Rinser. The controller is designed specifically to provide the wafer rinse system with flexibility. The controller allows the user to program several areas, including the dump cycle, the fill cycle, the start cascade, and the spray delay. Resistivity can also be programmed and an access code is incorporated to keep the program safe from tampering.

The optional Modutek Resistivity Monitor RM30a can be used with the DR Series to rinse to resistivity. The RM30a is useful for monitoring resistivity along with temperature inside the Quick Dump Rinser. It will also monitor the wet bench’s incoming water. When the resistivity setting has been reached, the rinse cycle discontinues when the level is full inside the DR Series rinser, resulting in a process specific rinse, and keeping the DI water usage to a minimum.

Since the Quick Dump Rinser is designed by Modutek to be easily added to a wet bench regardless if it is new or used, you can upgrade very easily without adding the new wet bench cost. The savings from less DI water usage and the increase in throughput will, together, help cover the upgrade’s overall cost. More information is available about the Quick Dump Rinser from Modutek and how it can be beneficial to your wafer manufacturing process by contacting us at 866-803-1533 or Sales@Modutek.com.

Modutek Makes Quartz Baths That Are Both Reliable and Safe

Modutek Corporation has successfully created a safe, reliable Quartz Bath system. It is manufactured by Modutek and is reasonably priced, which will allow integration into current production systems in a cost-effective manner. Modutek is known as the quality standard for quartz baths after over 30 years of developing and improving the designs for these baths.

Because of the nearly inert properties of pure quartz, other substances will usually not react with it. This makes quartz an excellent selection to use in semiconductor processes. Besides being non-reactive, its stability even when heated is a great advantage. Its hardness level on the Mohs scale is 7 and it is safe for demanding processes due to its lack of cleavage.

One of the several Quartz Baths available from Modutek is the QFa Series. Some of the benefits of this bath include heating that is fast and even from a 4-sided heating element that is nested and has a serrated overflow barrier and which heats to 360 degrees Fahrenheit, a flange design that is seamless and sloped, and a dual safety snap switch. Its design prevents runaway temperatures, minimizing potential damage. A vessel life that is longer than the average results in better reliability and more up-time. Particulate contamination is reduced along with easier laminar flow.

Some of the chemicals that can be used with the QFa Quartz Bath include H2SO4, SC1, H2O2, and more. It can operate at temperatures between 30ºC - 180ºC. Control of the operating temperature, depending on the process and the controller, can be ±1ºC. The heat-up rate of the operating temperature is 2ºC per minute, depending on which fluid is used, the system’s size, and other factors. Uses include cleaning, etching, and stripping. Its circulating fluid inlet/outlet is a ¾” male Flaretek. Users can choose to add a quartz diffuser plate, autolid, process temperature controller, liquid level sensor, and custom vessel sizes to perfectly fit necessary specifications.

The Qa Series Quartz Bath has similar features to the QFa, with a 5-sided heating element rather than 4-sided, which improves speed, efficiency, and evenness of heating. Options include a magnetic stirrer, remote timer, process controller, gravity drain, aspirator (dilution) valve system, and quartz bubbler.

The size of the Quartz Bath of either series is customizable. Call for more information or a quote for the Modutek Corporation Quartz Bath that will best fit your needs at 866-803-1533.