Modutek's standard line of silicon wet etching equipment already scores on factors such as cleanliness, repeatability, tight control and precise dosages. These factors will result in high output quality, fast processing, high yields, and reliable outcomes.
However, Modutek also offers specialized equipment that can further improve performance for certain processes:
1) Buffer Oxide Etch (BOE)
This process requires tight and precise temperature control while filtering lowers the particulate count and reduced acid consumption results in lower costs. Modutek uses the F-series sub-ambient circulation bath that is specifically designed for this process.
2) Piranha Etching
The Piranha etching process involves a mixture of sulfuric acid/hydrogen peroxide, which is highly corrosive. The mixture is also exothermic (accompanied by heat) when prepared. Modutek's QFa series of Quartz High Temperature Recirculating Baths is specially designed to withstand high temperatures.
3) Potassium Hydroxide (KOH) etching
Modutek Teflon tanks are ideal for KOH etching process because they can be custom fitted to any wet bench configuration. They come in three models to satisfy common heating and recirculating requirements:
Tfa series – temperature-controlled and overflow recirculating models
TI series – temperature-controlled and static models
TT series – static ambient temperature models
All Teflon tanks are made from PFA Teflon with special welding techniques to minimize the presence of undesirable by-products in the process and to reduce contamination.
4) Silicon Nitride Etching
The mixture used in this etching process consists of silicon nitride with a phosphoric acid deionized water. This is challenging because the concentration of the mixture changes as DI water evaporates and adding water to it can cause an explosion. Modutek's silicon nitride wet etching bath is specifically designed to address these issues and provides a reliable and safe process control.
This process requires tight and precise temperature control while filtering lowers the particulate count and reduced acid consumption results in lower costs. Modutek uses the F-series sub-ambient circulation bath that is specifically designed for this process.
2) Piranha Etching
The Piranha etching process involves a mixture of sulfuric acid/hydrogen peroxide, which is highly corrosive. The mixture is also exothermic (accompanied by heat) when prepared. Modutek's QFa series of Quartz High Temperature Recirculating Baths is specially designed to withstand high temperatures.
3) Potassium Hydroxide (KOH) etching
Modutek Teflon tanks are ideal for KOH etching process because they can be custom fitted to any wet bench configuration. They come in three models to satisfy common heating and recirculating requirements:
Tfa series – temperature-controlled and overflow recirculating models
TI series – temperature-controlled and static models
TT series – static ambient temperature models
All Teflon tanks are made from PFA Teflon with special welding techniques to minimize the presence of undesirable by-products in the process and to reduce contamination.
4) Silicon Nitride Etching
The mixture used in this etching process consists of silicon nitride with a phosphoric acid deionized water. This is challenging because the concentration of the mixture changes as DI water evaporates and adding water to it can cause an explosion. Modutek's silicon nitride wet etching bath is specifically designed to address these issues and provides a reliable and safe process control.
Read our recent article entitled “How Silicon Wet Etching Processes Are Improved with Specialized Equipment” to learn more about the equipment designed to support each of these etching processes. You can also call Modutek at 866-803-1533 or send an email to Modutek@modutek.com if you would like to set up a free consultation to discuss your specific needs.
