The cleaning of silicon wafers during semiconductor
manufacturing uses harsh chemicals to remove deposits from the silicon’s
surface.
The semiconductor manufacturing process includes multiple
steps, each of which may require cleaning the
silicon wafer before or after the production process segment. Highly
corrosive chemicals (like sulfuric acid and hydrogen peroxide) are used to
remove impurities.
For effective cleaning of the silicon wafer:
· The container used should be of an impervious nature.
· There needs to be tight control of the bath temperature.
Without controlling these three factors during the wafer
cleaning process, manufacturing such as diffusion will be affected.
Even the smallest remaining particle of contaminant can obstruct an electrical
connection and affect electrical characteristics. The resulting semiconductor
device will be unreliable or defective.
Baths made from high purity quartz don’t react with the
corrosive chemicals used in semiconductor manufacturing and are inert as a
source of contamination. Thus, a high-quality quartz bath is an ideal container
for the semiconductor wafer cleaning process.
During the cleaning process, the silicon wafers are immersed
in a chemical within the quartz bath. The baths
may be heated depending on the cleaning process, to a given temperature for a certain time period, and chemicals may
be re-circulated. The chemicals in the quartz bath remove organic impurities
from the surface of the wafers. Then the step of rinsing and drying the wafers will
follow. The wafers are then immersed in a mixture of hydrochloric acid and
hydrogen peroxide, where the metallic impurities are removed. After that, the
wafers will be subjected to processing steps.
Quartz baths, such as Modutek series QFa re-circulating baths, facilitate reliable cleaning of silicon
wafers.
If you have questions about how quartz baths are used in the wafer
cleaning process, please read the complete article “Why Quartz
Baths Are Used in the Wafer Cleaning Process”. Contact Modutek at
866-803-1533 to discuss your specific wafer cleaning needs.