Modutek
Corporation offers a wide range of wet processing
equipment that is
also customizable to deliver solutions for specialized applications. Silicon
wafer strip solutions, the company can deliver various types of equipment that
will support the following applications:
Silicon
Nitride Strip
The silicon nitride strip removes silicon nitride from silicon wafers containing integrated circuits in a hot acid bath. The main factors for a high quality result are the selectivity of the bath strip solution along with consistently repeating all the process variables.
The silicon nitride strip removes silicon nitride from silicon wafers containing integrated circuits in a hot acid bath. The main factors for a high quality result are the selectivity of the bath strip solution along with consistently repeating all the process variables.
The Modutek
Nb series silicon nitride etch bath regulates the bath temperature while adding
de-ionized water to control the water-to-acid ratio which provides the desired
selectivity and repeatability of the process.
Resist
Strip
For the photoresist strip, Modutek offers and advanced ozone cleaning process which can clean, etch or strip silicon wafers without the use of harsh chemicals. Thus this process is lower in cost and is also more environmentally-friendly.
For the photoresist strip, Modutek offers and advanced ozone cleaning process which can clean, etch or strip silicon wafers without the use of harsh chemicals. Thus this process is lower in cost and is also more environmentally-friendly.
Oxide Strip
(Buffered Oxide Etch - BOE)
Modutek’s F Series filtered sub-ambient circulation baths for BOE applications can reduce acid use while removing particles and improving yields.
Modutek’s F Series filtered sub-ambient circulation baths for BOE applications can reduce acid use while removing particles and improving yields.
Solvent-Based
Resist Strip
Modutek's SFa series temperature-controlled stainless steel recirculating baths can support a vast range of solvents such as IPA, acetone and resist strip solutions.
Modutek's SFa series temperature-controlled stainless steel recirculating baths can support a vast range of solvents such as IPA, acetone and resist strip solutions.
SPM Photo
Resist Strip
Modutek's QFa high temperature recirculation quartz baths can handle photo resist strip using sulphuric acid and hydrogen peroxide mixture for the SPM processes.
Modutek's QFa high temperature recirculation quartz baths can handle photo resist strip using sulphuric acid and hydrogen peroxide mixture for the SPM processes.
Process
engineers who are considering various silicon wafer strip solutions can rely on
Modutek to provide the appropriate wet processing
equipment for their
application. For a free consultation
or quote on selecting equipment for specific wafer strip applications call
Modutek at 866-803-1533 or email Modutek@modutek.com. You can read more details about Modutek’s silicon wafer solutions by
reading the article entitled “Silicon
Wafer Strip Solutions for Wet Processing Equipment Applications.”